A semiconductor laser suitably fabricated by planar technology
文献类型：会议论文
| 作者 | Yu LJ
|
| 出版日期 | 2001 |
| 会议名称 | 6th international conference on solid-state and integrated-circuit technology |
| 会议日期 | oct 22-25, 2001 |
| 会议地点 | shanghai, peoples r china |
| 页码 | 1234-1238 |
| 通讯作者 | huang yz chinese acad sci inst semicond state key lab integrated optoelect pob 912 beijing 100083 peoples r china. |
| 中文摘要 | the semiconductor microlasers with an equilateral triangle resonator which can be fabricated by dry etching technique from the laser wafer of the edge emitting laser, are analyzed by fdtd technique and rate equations. the results show that etr microlaser is suitable to realize single mode operation. by connecting an output waveguide to one of the vertices of the etr, we still can get the confined modes with high quality factors. the em microlasers are potential light sources for photonic integrated circuits. |
| 英文摘要 | the semiconductor microlasers with an equilateral triangle resonator which can be fabricated by dry etching technique from the laser wafer of the edge emitting laser, are analyzed by fdtd technique and rate equations. the results show that etr microlaser is suitable to realize single mode operation. by connecting an output waveguide to one of the vertices of the etr, we still can get the confined modes with high quality factors. the em microlasers are potential light sources for photonic integrated circuits.; 于2010-10-29批量导入; made available in dspace on 2010-10-29t06:36:40z (gmt). no. of bitstreams: 1 2850.pdf: 232565 bytes, checksum: d54a7e82f393cec80cb77c10bcfdfd0b (md5) previous issue date: 2001; chinese inst electr.; ieee beijing sect.; ieee electron devices soc.; ieee eds beijing chapter.; ieee eds shanghai chapter.; ieee solid state circuits soc.; japan soc appl phys.; iee, electr div.; iee korea.; assoc asia pacific phys soc.; chinese acad sci, inst semicond, state key lab integrated optoelect, beijing 100083, peoples r china |
| 收录类别 | CPCI-S |
| 会议主办者 | chinese inst electr.; ieee beijing sect.; ieee electron devices soc.; ieee eds beijing chapter.; ieee eds shanghai chapter.; ieee solid state circuits soc.; japan soc appl phys.; iee, electr div.; iee korea.; assoc asia pacific phys soc. |
| 会议录 | solid-state and integrated-circuit technology, vols 1 and 2, proceedings
 |
| 会议录出版者 | ieee ; 345 e 47th st, new york, ny 10017 usa |
| 学科主题 | 光电子学 |
| 会议录出版地 | 345 e 47th st, new york, ny 10017 usa |
| 语种 | 英语 |
| ISBN号 | 0-7803-6520-8 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/13677]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Yu LJ. A semiconductor laser suitably fabricated by planar technology[C]. 见:6th international conference on solid-state and integrated-circuit technology. shanghai, peoples r china. oct 22-25, 2001. |
入库方式： OAI收割
来源：半导体研究所
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