A novel method to measure coma aberration of projection system
文献类型：期刊论文
| 作者 | Ma MY(马明英) ; Wang XC(王向朝) ; Wang Fan |
| 刊名 | optik
 |
| 出版日期 | 2006 |
| 卷号 | 117期号:11页码:532 |
| 关键词 | optical lithography projection system pattern displacement coma aberration zernike coefficients |
| ISSN号 | 0030-4026 |
| 中文摘要 | a novel method to measure coma aberration by pattern displacements at different defocus positions is proposed in this paper. the effect of defocus on coma-induced pattern displacement is analyzed. the measuring principle of the method is described in detail. using the simulation program prolith, the proportionality factors between pattern displacement and coma aberration at different defocus positions are calculated. it is proved that the method is simple to perform and the measurement accuracy of coma can increase approximately by 25% by this novel method. (c) 2006 elsevier gmbh. all rights reserved. |
| 收录类别 | EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000242165200006 |
| 公开日期 | 2009-09-18 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/1958]  |
| 专题 | 上海光学精密机械研究所_信息光学开放实验室 |
| 推荐引用方式 GB/T 7714 | Ma MY,Wang XC,Wang Fan. A novel method to measure coma aberration of projection system[J]. optik,2006,117(11):532, 536. |
| APA | 马明英,王向朝,&Wang Fan.(2006).A novel method to measure coma aberration of projection system.optik,117(11),532. |
| MLA | 马明英,et al."A novel method to measure coma aberration of projection system".optik 117.11(2006):532. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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