Coma measurement using a PSM and transmission image sensor
文献类型:期刊论文
作者 | Wang F ; Wang XZ ; Ma MY(马明英) ; Zhang DQ ; Shi WJ ; Hu HM |
刊名 | optik
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出版日期 | 2006 |
卷号 | 117期号:1页码:21 |
关键词 | optical lithography aberrations projection lens image quality Zernike coefficients |
ISSN号 | 0030-4026 |
中文摘要 | as feature size decreases, especially with the use of resolution enhancement technique, requirements for the coma aberrations in the projection lenses of the lithographic tools have become extremely severe. so, fast and accurate in situ measurement of coma is necessary. in the present paper, we present a new method for characterizing the coma aberrations in the projection lens using a phase-shifting mask and a transmission image sensor. by measuring the image positions at multiple na and partial coherence settings, we are able to extract the coma aberration. the simulation results show that the accuracy of coma measurement increases approximately 20% compared to the previous straightforward measurement technique. (c) 2005 elsevier gmbh. all rights reserved. |
收录类别 | EI |
语种 | 英语 |
WOS记录号 | WOS:000235079500004 |
公开日期 | 2009-09-18 |
源URL | [http://ir.siom.ac.cn/handle/181231/1960] ![]() |
专题 | 上海光学精密机械研究所_信息光学开放实验室 |
推荐引用方式 GB/T 7714 | Wang F,Wang XZ,Ma MY,et al. Coma measurement using a PSM and transmission image sensor[J]. optik,2006,117(1):21, 25. |
APA | Wang F,Wang XZ,马明英,Zhang DQ,Shi WJ,&Hu HM.(2006).Coma measurement using a PSM and transmission image sensor.optik,117(1),21. |
MLA | Wang F,et al."Coma measurement using a PSM and transmission image sensor".optik 117.1(2006):21. |
入库方式: OAI收割
来源:上海光学精密机械研究所
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