中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Coma measurement using a PSM and transmission image sensor

文献类型:期刊论文

作者Wang F ; Wang XZ ; Ma MY(马明英) ; Zhang DQ ; Shi WJ ; Hu HM
刊名optik
出版日期2006
卷号117期号:1页码:21
关键词optical lithography aberrations projection lens image quality Zernike coefficients
ISSN号0030-4026
中文摘要as feature size decreases, especially with the use of resolution enhancement technique, requirements for the coma aberrations in the projection lenses of the lithographic tools have become extremely severe. so, fast and accurate in situ measurement of coma is necessary. in the present paper, we present a new method for characterizing the coma aberrations in the projection lens using a phase-shifting mask and a transmission image sensor. by measuring the image positions at multiple na and partial coherence settings, we are able to extract the coma aberration. the simulation results show that the accuracy of coma measurement increases approximately 20% compared to the previous straightforward measurement technique. (c) 2005 elsevier gmbh. all rights reserved.
收录类别EI
语种英语
WOS记录号WOS:000235079500004
公开日期2009-09-18
源URL[http://ir.siom.ac.cn/handle/181231/1960]  
专题上海光学精密机械研究所_信息光学开放实验室
推荐引用方式
GB/T 7714
Wang F,Wang XZ,Ma MY,et al. Coma measurement using a PSM and transmission image sensor[J]. optik,2006,117(1):21, 25.
APA Wang F,Wang XZ,马明英,Zhang DQ,Shi WJ,&Hu HM.(2006).Coma measurement using a PSM and transmission image sensor.optik,117(1),21.
MLA Wang F,et al."Coma measurement using a PSM and transmission image sensor".optik 117.1(2006):21.

入库方式: OAI收割

来源:上海光学精密机械研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。