中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
A study on GaP/Si heterostructures grown by GS-MBE

文献类型:会议论文

作者Yu JZ ; Chen BW ; Yu Z ; Wang QM
出版日期1998
会议名称conference on integrated optoelectronics ii
会议日期sep 18-19, 1998
会议地点beijing, peoples r china
关键词GaP/Si heterostructure GS-MBE lattice match X-ray double crystal diffraction photoluminescence (PL)
页码9-12
通讯作者yu jz chinese acad sci inst semicond beijing 100083 peoples r china.
中文摘要gap/si is a promoting heterostructure for si-based optoelectronic devices since lattice constants of gap and si are so closed that they can match with each other. gap was successfully grow on (100) si subtracts by gas-source molecular bean epitaxy (gs-mbe) in the study. the gap/si heterostructure was characterized by x-ray double crystal diffraction, anger electron spectrograph, x-ray photonic spectrograph and photoluminescence (pl) measurements. the results showed that the epitaxial gap layers are single crystalline, in which a parallel to and a (perpendicular to)are 0.54322 and 0.54625 nm, respectively. the peaks in pl spectra of gap epitaxial layer grown on si are 650, 627 and 640 nm, respectively. the study demonstrated that gap/si is a kind of lattice matched heterostructures and will be a promoting materials for future integrated photonics.
英文摘要gap/si is a promoting heterostructure for si-based optoelectronic devices since lattice constants of gap and si are so closed that they can match with each other. gap was successfully grow on (100) si subtracts by gas-source molecular bean epitaxy (gs-mbe) in the study. the gap/si heterostructure was characterized by x-ray double crystal diffraction, anger electron spectrograph, x-ray photonic spectrograph and photoluminescence (pl) measurements. the results showed that the epitaxial gap layers are single crystalline, in which a parallel to and a (perpendicular to)are 0.54322 and 0.54625 nm, respectively. the peaks in pl spectra of gap epitaxial layer grown on si are 650, 627 and 640 nm, respectively. the study demonstrated that gap/si is a kind of lattice matched heterostructures and will be a promoting materials for future integrated photonics.; 于2010-10-29批量导入; made available in dspace on 2010-10-29t06:37:17z (gmt). no. of bitstreams: 1 3030.pdf: 249575 bytes, checksum: 5214b25eb4dbcd11e27bbcc984e9f953 (md5) previous issue date: 1998; spie int soc opt engn.; cos chinese opt soc.; coema.; chinese acad sci, inst semicond, beijing 100083, peoples r china
收录类别CPCI-S
会议主办者spie int soc opt engn.; cos chinese opt soc.; coema.
会议录integrated optoelectronics ii, 3551
会议录出版者spie-int soc optical engineering ; 1000 20th st, po box 10, bellingham, wa 98227-0010 usa
学科主题光电子学
会议录出版地1000 20th st, po box 10, bellingham, wa 98227-0010 usa
语种英语
ISSN号0277-786x
ISBN号0-8194-3012-9
源URL[http://ir.semi.ac.cn/handle/172111/13855]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Yu JZ,Chen BW,Yu Z,et al. A study on GaP/Si heterostructures grown by GS-MBE[C]. 见:conference on integrated optoelectronics ii. beijing, peoples r china. sep 18-19, 1998.

入库方式: OAI收割

来源:半导体研究所

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