Influence of substrate orientation on In0.5Ga0.5As/GaAs quantum dots grown by molecular beam epitaxy
文献类型:会议论文
作者 | Xu B![]() ![]() |
出版日期 | 2000 |
会议名称 | 50th iumrs international conference on advanced materials |
会议日期 | jun 13-18, 1999 |
会议地点 | beijing, peoples r china |
关键词 | quantum dots high index molecular beam epitaxy photoluminescence SURFACE SEGREGATION ORIENTED GAAS INGAAS ISLANDS WELLS DISKS |
页码 | 134-140 |
通讯作者 | jiang wh chinese acad sci inst semicond inst semicond mat sci pob 912 beijing 100083 peoples r china. |
中文摘要 | in this paper, in0.5ga0.5as quantum dots are fabricated on gaas (100) and (n11)a/b (n = 3, 5) substrates by molecular beam epitaxy. atomic force microscopy shows that the quantum dots on each oriented substrate are different in size, shape and distribution. in addition, photoluminescence spectra from these quantum dots are different in emission peak position, line width and integrated intensity. auger electron spectra demonstrate that in concentration is larger near the surface than inside quantum dots, suggesting the occurrence of surface segregation effect during the growth of ingaas dots. the surface segregation effect is found to be related to substrate orientation. (c) 2000 elsevier science b.v. all rights reserved. |
英文摘要 | in this paper, in0.5ga0.5as quantum dots are fabricated on gaas (100) and (n11)a/b (n = 3, 5) substrates by molecular beam epitaxy. atomic force microscopy shows that the quantum dots on each oriented substrate are different in size, shape and distribution. in addition, photoluminescence spectra from these quantum dots are different in emission peak position, line width and integrated intensity. auger electron spectra demonstrate that in concentration is larger near the surface than inside quantum dots, suggesting the occurrence of surface segregation effect during the growth of ingaas dots. the surface segregation effect is found to be related to substrate orientation. (c) 2000 elsevier science b.v. all rights reserved.; 于2010-11-15批量导入; zhangdi于2010-11-15 17:02:22导入数据到semi-ir的ir; made available in dspace on 2010-11-15t09:02:22z (gmt). no. of bitstreams: 1 2944.pdf: 328470 bytes, checksum: 88866519c0885858eb998fd825334788 (md5) previous issue date: 2000; lab semiconduct mat sci.; inst semiconduct.; chinese acad sci.; chinese acad sci, inst semicond, inst semicond mat sci, beijing 100083, peoples r china |
收录类别 | CPCI-S |
会议主办者 | lab semiconduct mat sci.; inst semiconduct.; chinese acad sci. |
会议录 | physica e, 8 (2)
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会议录出版者 | elsevier science bv ; po box 211, 1000 ae amsterdam, netherlands |
学科主题 | 半导体材料 |
会议录出版地 | po box 211, 1000 ae amsterdam, netherlands |
语种 | 英语 |
ISSN号 | 1386-9477 |
源URL | [http://ir.semi.ac.cn/handle/172111/14967] ![]() |
专题 | 半导体研究所_中国科学院半导体研究所(2009年前) |
推荐引用方式 GB/T 7714 | Xu B,Ye XL. Influence of substrate orientation on In0.5Ga0.5As/GaAs quantum dots grown by molecular beam epitaxy[C]. 见:50th iumrs international conference on advanced materials. beijing, peoples r china. jun 13-18, 1999. |
入库方式: OAI收割
来源:半导体研究所
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