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Chinese Academy of Sciences Institutional Repositories Grid
Influence of substrate orientation on In0.5Ga0.5As/GaAs quantum dots grown by molecular beam epitaxy

文献类型:会议论文

作者Xu B; Ye XL
出版日期2000
会议名称50th iumrs international conference on advanced materials
会议日期jun 13-18, 1999
会议地点beijing, peoples r china
关键词quantum dots high index molecular beam epitaxy photoluminescence SURFACE SEGREGATION ORIENTED GAAS INGAAS ISLANDS WELLS DISKS
页码134-140
通讯作者jiang wh chinese acad sci inst semicond inst semicond mat sci pob 912 beijing 100083 peoples r china.
中文摘要in this paper, in0.5ga0.5as quantum dots are fabricated on gaas (100) and (n11)a/b (n = 3, 5) substrates by molecular beam epitaxy. atomic force microscopy shows that the quantum dots on each oriented substrate are different in size, shape and distribution. in addition, photoluminescence spectra from these quantum dots are different in emission peak position, line width and integrated intensity. auger electron spectra demonstrate that in concentration is larger near the surface than inside quantum dots, suggesting the occurrence of surface segregation effect during the growth of ingaas dots. the surface segregation effect is found to be related to substrate orientation. (c) 2000 elsevier science b.v. all rights reserved.
英文摘要in this paper, in0.5ga0.5as quantum dots are fabricated on gaas (100) and (n11)a/b (n = 3, 5) substrates by molecular beam epitaxy. atomic force microscopy shows that the quantum dots on each oriented substrate are different in size, shape and distribution. in addition, photoluminescence spectra from these quantum dots are different in emission peak position, line width and integrated intensity. auger electron spectra demonstrate that in concentration is larger near the surface than inside quantum dots, suggesting the occurrence of surface segregation effect during the growth of ingaas dots. the surface segregation effect is found to be related to substrate orientation. (c) 2000 elsevier science b.v. all rights reserved.; 于2010-11-15批量导入; zhangdi于2010-11-15 17:02:22导入数据到semi-ir的ir; made available in dspace on 2010-11-15t09:02:22z (gmt). no. of bitstreams: 1 2944.pdf: 328470 bytes, checksum: 88866519c0885858eb998fd825334788 (md5) previous issue date: 2000; lab semiconduct mat sci.; inst semiconduct.; chinese acad sci.; chinese acad sci, inst semicond, inst semicond mat sci, beijing 100083, peoples r china
收录类别CPCI-S
会议主办者lab semiconduct mat sci.; inst semiconduct.; chinese acad sci.
会议录physica e, 8 (2)
会议录出版者elsevier science bv ; po box 211, 1000 ae amsterdam, netherlands
学科主题半导体材料
会议录出版地po box 211, 1000 ae amsterdam, netherlands
语种英语
ISSN号1386-9477
源URL[http://ir.semi.ac.cn/handle/172111/14967]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Xu B,Ye XL. Influence of substrate orientation on In0.5Ga0.5As/GaAs quantum dots grown by molecular beam epitaxy[C]. 见:50th iumrs international conference on advanced materials. beijing, peoples r china. jun 13-18, 1999.

入库方式: OAI收割

来源:半导体研究所

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