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High-concentration hydrogen in unintentionally doped GaN

文献类型:会议论文

作者Zhang JP ; Wang XL ; Sun DZ ; Li XB ; Kong MY
出版日期1998
会议名称2nd international conference on nitride semiconductors (icns 97)
会议日期oct 27-31, 1997
会议地点tokushima city, japan
关键词gallium nitride gas source molecular beam epitaxy hydrogen autodoping FILMS
页码566-569
通讯作者zhang jp chinese acad sci inst semicond pob 912 beijing 100083 peoples r china. 电子邮箱地址: zhangjp@red.semi.ac.cn
中文摘要we use nuclear reaction analysis to study hydrogen in unintentionally doped gan, and high-concentration hydrogen, nearly 10(21) cm(-3), is detected. accordingly, a broad but intense infrared absorption zone with a peak at 2962 cm(-1) is reported, which is tentatively assigned to the stretch mode of nh: ga complex. the complex is assumed to be one candidate answering for background electrons in unintentionally doped gan. (c) 1998 elsevier science b.v. all rights reserved.
英文摘要we use nuclear reaction analysis to study hydrogen in unintentionally doped gan, and high-concentration hydrogen, nearly 10(21) cm(-3), is detected. accordingly, a broad but intense infrared absorption zone with a peak at 2962 cm(-1) is reported, which is tentatively assigned to the stretch mode of nh: ga complex. the complex is assumed to be one candidate answering for background electrons in unintentionally doped gan. (c) 1998 elsevier science b.v. all rights reserved.; 于2010-11-15批量导入; zhangdi于2010-11-15 17:02:37导入数据到semi-ir的ir; made available in dspace on 2010-11-15t09:02:37z (gmt). no. of bitstreams: 1 3059.pdf: 111855 bytes, checksum: 7f7f6cdf9b255e91f1d46bb3c8aa81f6 (md5) previous issue date: 1998; japan soc appl phys.; inst electr informat & commun engineers.; ieee.; electron devices soc.; chinese acad sci, inst semicond, beijing 100083, peoples r china
收录类别CPCI-S
会议主办者japan soc appl phys.; inst electr informat & commun engineers.; ieee.; electron devices soc.
会议录journal of crystal growth, 189
会议录出版者elsevier science bv ; po box 211, 1000 ae amsterdam, netherlands
学科主题半导体材料
会议录出版地po box 211, 1000 ae amsterdam, netherlands
语种英语
ISSN号0022-0248
源URL[http://ir.semi.ac.cn/handle/172111/15079]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Zhang JP,Wang XL,Sun DZ,et al. High-concentration hydrogen in unintentionally doped GaN[C]. 见:2nd international conference on nitride semiconductors (icns 97). tokushima city, japan. oct 27-31, 1997.

入库方式: OAI收割

来源:半导体研究所

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