Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information
文献类型：期刊论文
| 作者 | Wang, Zhaoying1,2; Liu, Bingwen2; Zhao, Evan W.2; Jin, Ke2; Du, Yingge3; Neeway, James J.4; Ryan, Joseph V.4; Hu, Dehong2; Zhang, Kelvin H. L.3; Hong, Mina2 |
| 刊名 | JOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY
 |
| 出版日期 | 2015-08-01 |
| 卷号 | 26期号:8页码:1283-1290 |
| 关键词 | ToF-SIMS Argon cluster SON68 glass Perovskite oxide thin films Sputtering rate Charging alleviation |
| 英文摘要 | The use of an argon cluster ion sputtering source has been demonstrated to perform superiorly relative to traditional oxygen and cesium ion sputtering sources for ToF-SIMS depth profiling of insulating materials. The superior performance has been attributed to effective alleviation of surface charging. A simulated nuclear waste glass (SON68) and layered hole-perovskite oxide thin films were selected as model systems because of their fundamental and practical significance. Our results show that high sputter rates and accurate interfacial information can be achieved simultaneously for argon cluster sputtering, whereas this is not the case for cesium and oxygen sputtering. Therefore, the implementation of an argon cluster sputtering source can significantly improve the analysis efficiency of insulating materials and, thus, can expand its applications to the study of glass corrosion, perovskite oxide thin film characterization, and many other systems of interest. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2016-05-09 |
| 源URL | [http://ir.iccas.ac.cn/handle/121111/27803]  |
| 专题 | 化学研究所_活体分析化学实验室 |
| 作者单位 | 1.Chinese Acad Sci, CAS Key Lab Analyt Chem Living Biosyst, Beijing Natl Lab Mol Sci, Beijing Ctr Mass Spectrometry,Inst Chem, Beijing 100190, Peoples R China 2.Pacific NW Natl Lab, WR Wiley Environm Mol Sci Lab, Richland, WA 99354 USA 3.Pacific NW Natl Lab, Fundamental & Comp Sci Directorate, Richland, WA 99354 USA 4.Pacific NW Natl Lab, Energy & Environm Directorate, Richland, WA 99354 USA |
| 推荐引用方式 GB/T 7714 | Wang, Zhaoying,Liu, Bingwen,Zhao, Evan W.,et al. Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information[J]. JOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY,2015,26(8):1283-1290. |
| APA | Wang, Zhaoying.,Liu, Bingwen.,Zhao, Evan W..,Jin, Ke.,Du, Yingge.,...&Zhu, Zihua.(2015).Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information.JOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY,26(8),1283-1290. |
| MLA | Wang, Zhaoying,et al."Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information".JOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY 26.8(2015):1283-1290. |
入库方式： OAI收割
来源：化学研究所
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