中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings

文献类型:期刊论文

作者Yuan Qiongyan ; Wang XC(王向朝) ; Qiu Zicheng ; Wang Fan ; Ma MY(马明英) ; He Le
刊名opt. express
出版日期2007
卷号15期号:24页码:15878
关键词Computer simulation Diffraction gratings Image analysis Phase shift
ISSN号1094-4087
中文摘要in this paper, we propose a novel method for measuring the coma aberrations of lithographic projection optics based on relative image displacements at multiple illumination settings. the measurement accuracy of coma can be improved because the phase-shifting gratings are more sensitive to the aberrations than the binary gratings used in the tamis technique, and the impact of distortion on displacements of aerial image can be eliminated when the relative image displacements are measured. the prolith simulation results show that, the measurement accuracy of coma increases by more than 25% under conventional illumination, and the measurement accuracy of primary coma increases by more than 20% under annular illumination, compared with the tamis technique. (c) 2007 optical society of america.
收录类别EI
语种英语
WOS记录号WOS:000251223900025
公开日期2009-09-18
源URL[http://ir.siom.ac.cn/handle/181231/2158]  
专题上海光学精密机械研究所_信息光学开放实验室
推荐引用方式
GB/T 7714
Yuan Qiongyan,Wang XC,Qiu Zicheng,et al. Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings[J]. opt. express,2007,15(24):15878, 15885.
APA Yuan Qiongyan,王向朝,Qiu Zicheng,Wang Fan,马明英,&He Le.(2007).Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings.opt. express,15(24),15878.
MLA Yuan Qiongyan,et al."Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings".opt. express 15.24(2007):15878.

入库方式: OAI收割

来源:上海光学精密机械研究所

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