A novel method for measuring the coma of a lithographic projection system by use of mirror-symmetry marks
文献类型：期刊论文
| 作者 | Zhang Dongqing ; Wang XC(王向朝) ; Shi Weijie ; Wang Fan |
| 刊名 | opt. laser technol.
 |
| 出版日期 | 2007 |
| 卷号 | 39期号:5页码:922 |
| ISSN号 | 0030-3992 |
| 关键词 | coma projection system lithographic tool |
| 中文摘要 | a novel method for measuring the coma of a lithographic projection system is proposed and the principle of the method is described. by utilizing mirror-symmetry marks, the adverse effects of axial aberrations on the coma measurement are avoided. experimental results demonstrated that the method has high accuracy. compared with tamis, the conventional technique used for coma measurement, the method is more reliable because the influences of the process factors on the lateral displacements have been considered. (c) 2006 elsevier ltd. all rights reserved. |
| 收录类别 | EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000245258800007 |
| 公开日期 | 2009-09-18 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/2162]  |
| 专题 | 上海光学精密机械研究所_信息光学开放实验室 |
| 推荐引用方式 GB/T 7714 | Zhang Dongqing,Wang XC,Shi Weijie,et al. A novel method for measuring the coma of a lithographic projection system by use of mirror-symmetry marks[J]. opt. laser technol.,2007,39(5):922, 925. |
| APA | Zhang Dongqing,王向朝,Shi Weijie,&Wang Fan.(2007).A novel method for measuring the coma of a lithographic projection system by use of mirror-symmetry marks.opt. laser technol.,39(5),922. |
| MLA | Zhang Dongqing,et al."A novel method for measuring the coma of a lithographic projection system by use of mirror-symmetry marks".opt. laser technol. 39.5(2007):922. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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