Thickness and component distributions of yttrium-titanium alloy films in multi-electron-beam physical vapor deposition
文献类型：会议论文
| 作者 | Li SH(李帅辉) ; Shu YH(舒勇华); Fan J(樊菁)
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| 出版日期 | 2007 |
| 会议名称 | Vacuum Metallurgy and Surface Engineering, Proceedings/真空冶金与表面工程——第八届真空冶金与表面工程学术会议 |
| 会议日期 | JUN 16-19, 2007 |
| 会议地点 | Shenyang, PEOPLES R CHINA |
| 关键词 | electron beam physical vapor deposition thin film thickness and species distributions vapor atom non-equilibrium transport KeyWords Plus:MONTE-CARLO-SIMULATION SPHERE MODEL EVAPORATION |
| 通讯作者 | Li, SH |
| 中文摘要 | Thickness and component distributions of large-area thin films are an issue of international concern in the field of material processing. The present work employs experiments and direct simulation Monte Carlo (DSMC) method to investigate three-dimensional low-density, non-equilibrium jets of yttrium and titanium vapor atoms in an electron-beams physical vapor deposition (EBPVD) system furnished with two or three electron-beams, and obtains their deposition thickness and component distributions onto 4-Inch and 6-inch mono-crystal silicon wafers. The DSMC results are found in excellent agreement with our measurements, such as evaporation rates of yttrium and titanium measured in-situ by quartz crystal resonators, deposited film thickness distribution measured by Rutherford backscattering spectrometer (RBS) and surface profilometer and deposited film molar ratio distribution measured by RBS and inductively coupled plasma atomic emission spectrometer (ICP-AES). This can be taken as an indication that a combination of DSMC method with elaborate measurements may be satisfactory for predicting and designing accurately the transport process of EBPVD at the atomic level. |
| 收录类别 | CPCI-S |
| 语种 | 英语 |
| ISBN号 | 978-7-121-04043-6 |
| WOS记录号 | WOS:000248081800036 |
| 源URL | [http://dspace.imech.ac.cn/handle/311007/58896]  |
| 专题 | 力学研究所_力学所知识产出(1956-2008) |
| 推荐引用方式 GB/T 7714 | Li SH,Shu YH,Fan J. Thickness and component distributions of yttrium-titanium alloy films in multi-electron-beam physical vapor deposition[C]. 见:Vacuum Metallurgy and Surface Engineering, Proceedings/真空冶金与表面工程——第八届真空冶金与表面工程学术会议. Shenyang, PEOPLES R CHINA. JUN 16-19, 2007. |
入库方式： OAI收割
来源：力学研究所
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