Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source
文献类型：期刊论文
| 作者 | Gong, Y; Chen, B ; Ni, QL; Cui, MQ; Zhao, YD; Wu, ZH; Cui MQ(崔明启); Zhao YD(赵屹东); Wu ZH(吴忠华)
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| 刊名 | HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION
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| 出版日期 | 2005 |
| 卷号 | 29期号:11页码:1104-1106 |
| 关键词 | synchrotron radiation source glazing exit X-ray fluorescence thin film |
| 通讯作者 | CAS, State Key Lab Appl Opt, Inst Opt, Changchun 130033, Peoples R China ; CAS, Inst High Energy Phys, Beijing 100049, Peoples R China |
| 英文摘要 | The grazing exit X-ray fluorescence provides a possibility to analyze the characteristics of thin film and, multilayer, especially the thickness, interface structure and composition. The Cr film samples with different thickness deposited on silicon (Si) bases are tested with grazing method using Beijing synchrotron radiation source (SR) as excitation light. The results agree with the theoretical prediction, and the interference of emitted X-ray has been observed. |
| 学科主题 | Physics |
| 类目[WOS] | Physics, Nuclear ; Physics, Particles & Fields |
| 研究领域[WOS] | Physics |
| 原文出处 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000233323300016 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/239050]  |
| 专题 | 高能物理研究所_加速器中心 高能物理研究所_多学科研究中心 |
| 作者单位 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Gong, Y,Chen, B,Ni, QL,et al. Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source[J]. HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,2005,29(11):1104-1106. |
| APA | Gong, Y.,Chen, B.,Ni, QL.,Cui, MQ.,Zhao, YD.,...&吴忠华.(2005).Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source.HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,29(11),1104-1106. |
| MLA | Gong, Y,et al."Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source".HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION 29.11(2005):1104-1106. |
入库方式： OAI收割
来源：高能物理研究所
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