The microstructure of hydrogenated microcrystalline silicon thin films studied by small-angle x-ray scattering
文献类型：期刊论文
| 作者 | Zhou, BQ; Liu, FZ; Zhu, MF; Gu, JH; Zhou, YQ; Liu, JL; Dong, BZ; Li, GH; Ding, K; Dong BZ(董宝中) |
| 刊名 | ACTA PHYSICA SINICA
 |
| 出版日期 | 2005 |
| 卷号 | 54期号:5页码:2172-2175 |
| 关键词 | hydrogenated microcrystalline silicon thin film microstructure micro-voids small-angle x-ray scattering |
| 通讯作者 | Chinese Acad Sci, Grad Sch, Dept Phys, Beijing 100039, Peoples R China ; Inner Mongolia Normal Univ, Dept Phys, Hohhot 010022, Peoples R China ; Chinese Acad Sci, Inst High Energy Phys, Beijing Synchrotron Radiat Lab, Beijing 100039, Peoples R China ; Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China |
| 英文摘要 | The microstructures of hydrogenated microcrystalline silicon (tic-Si: H) thin films, prepared by plasma-enhanced chemical vapor deposition (PECVD), hot wire CVD(HWCVD) and plasma assisted HWCVD (PE-HWCVD), have been analyzed by the small angle x-ray scattering(SAXS) measurement. The SAXS data show that the microstructures of the μ c-Si: H films display different characteristics for different deposition techniques. For films deposited by PECVD, the volume fraction of micro-voids and mean size are smaller than those in HWCVD sample. Aided by suitable ion-bombardment, PE-HWCVD samples show a more compact structure than the HWCVD sample. The microstructure parameters of the μ c-Si: H thin films deposited by two-steps HWCVD and PE-HWCVD with Ar ions are evidently improved. The result of 45° tilting SAXS measurement indicates that the distribution of micro-voids in the film is anisotropic. The Fouriertransform infrared spectra confirm the SAXS data. |
| 学科主题 | Physics |
| 类目[WOS] | Physics, Multidisciplinary |
| 研究领域[WOS] | Physics |
| 原文出处 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000229049900038 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/239673]  |
| 专题 | 高能物理研究所_多学科研究中心 |
| 作者单位 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Zhou, BQ,Liu, FZ,Zhu, MF,et al. The microstructure of hydrogenated microcrystalline silicon thin films studied by small-angle x-ray scattering[J]. ACTA PHYSICA SINICA,2005,54(5):2172-2175. |
| APA | Zhou, BQ.,Liu, FZ.,Zhu, MF.,Gu, JH.,Zhou, YQ.,...&董宝中.(2005).The microstructure of hydrogenated microcrystalline silicon thin films studied by small-angle x-ray scattering.ACTA PHYSICA SINICA,54(5),2172-2175. |
| MLA | Zhou, BQ,et al."The microstructure of hydrogenated microcrystalline silicon thin films studied by small-angle x-ray scattering".ACTA PHYSICA SINICA 54.5(2005):2172-2175. |
入库方式： OAI收割
来源：高能物理研究所
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