The properties of the as-sputtered ZnO films under different deposition parameters after sulfidation
文献类型：期刊论文
| 作者 | Zhang RG(张仁刚); Wang BY(王宝义) ; Zhang H(张辉); Ma CX(马创新); Wei L(魏龙); Zhang, RG; Wang, BY; Zhang, H; Ma, CX; Long, W
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| 刊名 | ACTA PHYSICA SINICA
 |
| 出版日期 | 2005 |
| 卷号 | 54期号:5页码:2389-2393 |
| 关键词 | ZnS films magnetron sputtering sulfidation of ZnO solar cells |
| 通讯作者 | Chinese Acad Sci, Inst High Energy Phys, Key Lab Nucl Anal Tech, Beijing 100049, Peoples R China |
| 英文摘要 | ZnS films are produced on the glass and quartz substrates by sulfidation of the as-sputtered ZnO films in the H2S-H-2-N-2 mixture. The properties of the films are characterized by using the XRD, SEM and transmission measurements. The results show that the ZnS films with a hexagonol structure have a (002) preferred orientation. The crystallinity and optical transmission spectra of the ZnS films are related to working pressure and Ar/O-2 ratio during the deposition of the ZnO films. At the pressure > 1 Pa, the thickness of the ZnS films is very small, while at the pressure < 1 Pa the ZnO films are not converted completely to ZnS phase. In addition, an Ar/O-2 ratio higher or lower than 4: 1 will leads to the poor crystalline ZnS films. Also it is found that the ZnS films formed from the unannealed ZnO films almost have the same grain size as those formed from the in-air annealed ZnO films, due to the high (002) preferred orientation during the growth of the ZnS films. |
| 学科主题 | Physics |
| 类目[WOS] | Physics, Multidisciplinary |
| 研究领域[WOS] | Physics |
| 原文出处 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000229049900078 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/239738]  |
| 专题 | 高能物理研究所_核技术应用研究中心 高能物理研究所_多学科研究中心 中国科学院高能物理研究所_中国散裂中子源 |
| 作者单位 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Zhang RG,Wang BY,Zhang H,et al. The properties of the as-sputtered ZnO films under different deposition parameters after sulfidation[J]. ACTA PHYSICA SINICA,2005,54(5):2389-2393. |
| APA | 张仁刚.,王宝义.,张辉.,马创新.,魏龙.,...&Long, W.(2005).The properties of the as-sputtered ZnO films under different deposition parameters after sulfidation.ACTA PHYSICA SINICA,54(5),2389-2393. |
| MLA | 张仁刚,et al."The properties of the as-sputtered ZnO films under different deposition parameters after sulfidation".ACTA PHYSICA SINICA 54.5(2005):2389-2393. |
入库方式： OAI收割
来源：高能物理研究所
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