Mo/SiO2 multilayers for soft x-ray optical applications
文献类型：期刊论文
| 作者 | Wang, FP; Wang, PX; Lu, KQ; Fang, ZZ; Gao, M ; Duan, XF; Cui, MQ; Ma, HJ; Jiang, XM; Cui MQ(崔明启)
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| 刊名 | JOURNAL OF APPLIED PHYSICS
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| 出版日期 | 1999 |
| 卷号 | 85期号:6页码:3175-3179 |
| 通讯作者 | Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China ; Chinese Acad Sci, Ctr Condensed Matter Phys, Beijing 100080, Peoples R China ; Beijing Univ Sci & Technol, Dept Phys Mat, Beijing 100083, Peoples R China ; Beijing Lab Electron Microscopy, Beijing 100080, Peoples R China ; Chinese Acad Sci, Inst High Energy Phys, Beijing 100039, Peoples R China |
| 英文摘要 | The optimal reflectivity of soft-x-ray multilayers made of new pairs of materials was theoretically calculated in the wavelength range of 2.0-4.5 nm. Molybdenum and silicon dioxide were then selected for "high index'' and "low index'' layer, respectively, in the multilayer system. The microstructures and composition profiles of multilayers of molybdenum and silicon dioxide were investigated by means of low-angle x-ray diffraction, cross-sectional high resolution electron microscopy, an energy-filtering transmission electron microscope elemental mapping, and Auger electron spectrometry. The results show that no diffusion of Si into Mo layers has occurred, and only slight diffusion of O into Mo layers are seen. Sharp and relatively smooth interfaces have formed. With increasing number of layers, the interfacial roughness was propagated through the multilayer stack and low-frequency roughness increases while the high-frequency roughness decreases. (C) 1999 American Institute of Physics. [S0021-8979(99)00406-5]. |
| 学科主题 | Physics |
| 类目[WOS] | Physics, Applied |
| 研究领域[WOS] | Physics |
| 原文出处 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000079021200024 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/239879]  |
| 专题 | 高能物理研究所_多学科研究中心 |
| 作者单位 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Wang, FP,Wang, PX,Lu, KQ,et al. Mo/SiO2 multilayers for soft x-ray optical applications[J]. JOURNAL OF APPLIED PHYSICS,1999,85(6):3175-3179. |
| APA | Wang, FP.,Wang, PX.,Lu, KQ.,Fang, ZZ.,Gao, M.,...&姜晓明.(1999).Mo/SiO2 multilayers for soft x-ray optical applications.JOURNAL OF APPLIED PHYSICS,85(6),3175-3179. |
| MLA | Wang, FP,et al."Mo/SiO2 multilayers for soft x-ray optical applications".JOURNAL OF APPLIED PHYSICS 85.6(1999):3175-3179. |
入库方式： OAI收割
来源：高能物理研究所
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