High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies
文献类型：期刊论文
| 作者 | Li, CH; Ju, X; Jiang, XD; Huang, J; Zhou, XD; Zheng, Z; Wu, WD; Zheng, WG; Li, ZX ; Wang, BY
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| 刊名 | OPTICS EXPRESS
 |
| 出版日期 | 2011 |
| 卷号 | 19期号:7页码:6447-6457 |
| 通讯作者 | [Li, C. H. ; Ju, X.] Univ Sci & Technol Beijing, Dept Phys, Beijing 100083, Peoples R China ; [Li, C. H. ; Jiang, X. D. ; Huang, J. ; Zhou, X. D. ; Zheng, Z. ; Wu, W. D. ; Zheng, W. G.] CAEP, Res Ctr Laser Fus, Mianyang 621900, Peoples R China ; [Li, Z. X. ; Wang, B. Y.] Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China ; [Yu, X. H.] Shanghai Synchrotron Radiat Facil, Shanghai 201800, Peoples R China |
| 英文摘要 | We report on the characterization of modifications in fused silica after exposure to low fluence (2 J/cm(2)) 355 nm laser at repetition frequencies of 1 Hz, 5 Hz and 10 Hz. Synchrotron based XRF spectroscopy is employed to study concentration variation of metal inclusions in the surface layer. Positron annihilation lifetime spectroscopy is used to probe atomic size defects variation in bulk silica. FT-IR is used to characterize changes of bond length and angle of Si-O-Si covalent bond of irradiated silica. Compared to the basic frequency, the big loss of cerium and iron concentration, the size enlargement of vacancy cluster and the decrease of Si-O-Si covalent bond length after 10 Hz laser irradiation are illustrated by our data. These tiny modifications provide important data to investigate laser damage mechanism. (C) 2011 Optical Society of America |
| 学科主题 | Optics |
| 类目[WOS] | Optics |
| 研究领域[WOS] | Optics |
| 原文出处 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000288852700078 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/240076]  |
| 专题 | 高能物理研究所_多学科研究中心 高能物理研究所_核技术应用研究中心 |
| 作者单位 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Li, CH,Ju, X,Jiang, XD,et al. High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies[J]. OPTICS EXPRESS,2011,19(7):6447-6457. |
| APA | Li, CH.,Ju, X.,Jiang, XD.,Huang, J.,Zhou, XD.,...&王宝义.(2011).High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies.OPTICS EXPRESS,19(7),6447-6457. |
| MLA | Li, CH,et al."High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies".OPTICS EXPRESS 19.7(2011):6447-6457. |
入库方式： OAI收割
来源：高能物理研究所
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