Influence of ultrathin amorphous silicon layers on the nucleation of microcrystalline silicon films under hydrogen plasma treatment
文献类型：期刊论文
| 作者 | Zuo, ZW; Guan, WT; Wang, Y; Lu, J; Wang, JZ; Pu, L; Shi, Y; Zheng, YD; Luo, XY; Wang, HH
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| 刊名 | APPLIED PHYSICS LETTERS
 |
| 出版日期 | 2011 |
| 卷号 | 98期号:4页码:41902 |
| 通讯作者 | [Zuo, Z. W. ; Guan, W. T. ; Wang, Y. ; Lu, J. ; Wang, J. Z. ; Pu, L. ; Shi, Y. ; Zheng, Y. D.] Nanjing Univ, Sch Elect Sci & Engn, Key Lab Photon & Elect Mat, Nanjing 210093, Peoples R China ; [Luo, X. Y. ; Wang, H. H.] Inst High Energy Phys, Beijing Synchrotron Radiat Lab, Beijing 100049, Peoples R China |
| 英文摘要 | Microstructures of phosphorus-doped hydrogenated microcrystalline silicon (mu c-Si:H) thin films deposited by plasma-enhanced chemical vapor deposition are certainly dependent on the thickness of the H-2 plasma-treated amorphous silicon (a-Si:H) layers. An ultrathin H-treated a-Si:H layer is beneficial in obtaining a very thin mu c-Si:H film with high conductivity. Experimental results indicate that H-2 plasma treatment induces the occurrence of high-pressure H-2 in microvoids and causes compressive stress inside the ultrathin a-Si:H layers, thereby enhancing the generation of strained Si-Si bonds and nucleation sites and consequently accelerating the nucleation of mu c-Si:H films. (c) 2011 American Institute of Physics. [doi:10.1063/1.3548674] |
| 学科主题 | Physics |
| 类目[WOS] | Physics, Applied |
| 研究领域[WOS] | Physics |
| 原文出处 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000286676600009 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/240601]  |
| 专题 | 高能物理研究所_多学科研究中心 |
| 作者单位 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Zuo, ZW,Guan, WT,Wang, Y,et al. Influence of ultrathin amorphous silicon layers on the nucleation of microcrystalline silicon films under hydrogen plasma treatment[J]. APPLIED PHYSICS LETTERS,2011,98(4):41902. |
| APA | Zuo, ZW.,Guan, WT.,Wang, Y.,Lu, J.,Wang, JZ.,...&王焕华.(2011).Influence of ultrathin amorphous silicon layers on the nucleation of microcrystalline silicon films under hydrogen plasma treatment.APPLIED PHYSICS LETTERS,98(4),41902. |
| MLA | Zuo, ZW,et al."Influence of ultrathin amorphous silicon layers on the nucleation of microcrystalline silicon films under hydrogen plasma treatment".APPLIED PHYSICS LETTERS 98.4(2011):41902. |
入库方式： OAI收割
来源：高能物理研究所
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