Aligned amorphous and microcrystalline Si nanorods by glancing angle deposition at low temperature
文献类型：期刊论文
| 作者 | Ma, YH ; Liu, FZ; Zhu, MF; Liu, JL; Wang, HH; Yang, Y; Li, YF; Wang HH(王焕华)
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| 刊名 | NANOTECHNOLOGY
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| 出版日期 | 2009 |
| 卷号 | 20期号:27页码:275201 |
| 通讯作者 | [Ma, Yanhong ; Liu, Fengzhen ; Zhu, Meifang ; Liu, Jinlong] Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China ; [Wang, Huan-hua] Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China ; [Yang, Yi ; Li, Yongfang] Chinese Acad Sci, Inst Chem, Beijing 100190, Peoples R China |
| 英文摘要 | Aligned amorphous and crystallized silicon nanorods (SiNRs) were successfully fabricated at low temperatures using radio frequency magnetron sputtering and hot wire chemical vapor deposition with glancing angle incident flux. The influences of the deposition pressure, sputtering power, substrate rotation and hydrogen dilution ratio on the diameter, density, orientation and crystallization of the Si nanorods were systematically investigated. With increasing sputtering power, the density of Si nanorods decreases and the diameter of SiNRs increases. The pressure has the opposite effect on the growth of SiNRs compared with the sputtering power. By combining glancing angle deposition ( GLAD) with the hydrogen diluted silane in hot wire chemical vapor deposition (HWCVD), aligned crystallized Si nanorods with a crystalline volume fraction of 0.55 were achieved under a substrate temperature of 140 degrees C. The Si nanorods have been tested for photovoltaic application. |
| 学科主题 | Science & Technology - Other Topics; Materials Science; Physics |
| 类目[WOS] | Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied |
| 研究领域[WOS] | Science & Technology - Other Topics ; Materials Science ; Physics |
| 原文出处 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000267089600003 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/241056]  |
| 专题 | 高能物理研究所_多学科研究中心 |
| 作者单位 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Ma, YH,Liu, FZ,Zhu, MF,et al. Aligned amorphous and microcrystalline Si nanorods by glancing angle deposition at low temperature[J]. NANOTECHNOLOGY,2009,20(27):275201. |
| APA | Ma, YH.,Liu, FZ.,Zhu, MF.,Liu, JL.,Wang, HH.,...&王焕华.(2009).Aligned amorphous and microcrystalline Si nanorods by glancing angle deposition at low temperature.NANOTECHNOLOGY,20(27),275201. |
| MLA | Ma, YH,et al."Aligned amorphous and microcrystalline Si nanorods by glancing angle deposition at low temperature".NANOTECHNOLOGY 20.27(2009):275201. |
入库方式： OAI收割
来源：高能物理研究所
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