In situ surface topography measurement method of granite base in scanning wafer stage with laser interferometer
文献类型：期刊论文
| 作者 | He Le ; Wang XC(王向朝) ; Shi Weijie |
| 刊名 | optik
 |
| 出版日期 | 2008 |
| 卷号 | 119期号:1页码:1 |
| ISSN号 | 0030-4026 |
| 关键词 | laser interferometer topography measurement least squares method scanning wafer stage lithographic tool |
| 中文摘要 | topography of a granite surface has an effect on the vertical positioning of a wafer stage in a lithographic tool, when the wafer stage moves on the granite. the inaccurate measurement of the topography results in a bad leveling and focusing performance. in this paper, an in situ method to measure the topography of a granite surface with high accuracy is present. in this method, a high-order polynomial is set up to express the topography of the granite surface. two double-frequency laser interferometers are used to measure the tilts of the wafer stage in the x- and y-directions. from the sampling tilts information, the coefficients of the high-order polynomial can be obtained by a special algorithm. experiment results shows that the measurement reproducibility of the method is better than 10 nm. (c) 2006 elsevier gmbh. all rights reserved. |
| 收录类别 | EI |
| 语种 | 英语 |
| 公开日期 | 2009-09-18 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/2316]  |
| 专题 | 上海光学精密机械研究所_信息光学开放实验室 |
| 推荐引用方式 GB/T 7714 | He Le,Wang XC,Shi Weijie. In situ surface topography measurement method of granite base in scanning wafer stage with laser interferometer[J]. optik,2008,119(1):1, 6. |
| APA | He Le,王向朝,&Shi Weijie.(2008).In situ surface topography measurement method of granite base in scanning wafer stage with laser interferometer.optik,119(1),1. |
| MLA | He Le,et al."In situ surface topography measurement method of granite base in scanning wafer stage with laser interferometer".optik 119.1(2008):1. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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