Design of magnet and control of the beam emittance for Penning H- ion source
文献类型：期刊论文
| 作者 | 欧阳华甫 ; Zhang HS(张华顺); Ouyang, HF; Zhang, HS
|
| 刊名 | CHINESE PHYSICS C
 |
| 出版日期 | 2008 |
| 卷号 | 32期号:8页码:668-672 |
| 关键词 | H- ion source Magnetron ion source Penning ion source magnetic field gradient index |
| 通讯作者 | [Ouyang Hua-Fu ; Zhang Hua-Shun] CAS, Inst High Energy Phys, Beijing 100049, Peoples R China |
| 英文摘要 | The design requirement and principle of the deflection magnet for Magnetron and Penning H- ion source are discussed. It is proved that there exists a maximum emittance for the beam that may be transformed by the magnet into a state with equal Twiss parameters of alpha(r) = alpha(y) and beta(r) = beta(y), which is the requisite condition to get a minimum emittance at the entrance of RFQ after transporting by a LEBT with solenoids. For this maximum emittance, the corresponding magnetic field gradient index is 1. |
| 学科主题 | Physics |
| 类目[WOS] | Physics, Nuclear ; Physics, Particles & Fields |
| 研究领域[WOS] | Physics |
| 原文出处 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000258423200017 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/238238]  |
| 专题 | 高能物理研究所_加速器中心 |
| 作者单位 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | 欧阳华甫,Zhang HS,Ouyang, HF,et al. Design of magnet and control of the beam emittance for Penning H- ion source[J]. CHINESE PHYSICS C,2008,32(8):668-672. |
| APA | 欧阳华甫,张华顺,Ouyang, HF,&Zhang, HS.(2008).Design of magnet and control of the beam emittance for Penning H- ion source.CHINESE PHYSICS C,32(8),668-672. |
| MLA | 欧阳华甫,et al."Design of magnet and control of the beam emittance for Penning H- ion source".CHINESE PHYSICS C 32.8(2008):668-672. |
入库方式： OAI收割
来源：高能物理研究所
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