Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width
文献类型：期刊论文
| 作者 | Qiu Zicheng ; Wang XC(王向朝) ; Yuan Qiongyan ; Wang Fan |
| 刊名 | appl. optics
 |
| 出版日期 | 2009 |
| 卷号 | 48期号:2页码:261 |
| 关键词 | LITHOGRAPHY SIMULATION ABERRATION MEASUREMENT PROJECTION OPTICS LENS ABERRATIONS TOOLS |
| ISSN号 | 0003-6935 |
| 中文摘要 | the correlation between the coma sensitivity of the alternating phase-shifting mask (alt-psm) mark and the mark's structure is studied based on the hopkins theory of partially coherent imaging and positive resist optical lithography (prolith) simulation. it is found that an optimized alt-psm mark with its phase width being two-thirds its pitch has a higher sensitivity to coma than alt-psm marks with the same pitch and the different phase widths. the pitch of the alt-psm mark is also optimized by prolith simulation, and the structure of p - 1.92 lambda/na and pw = 2p/3 proves to be with the highest sensitivity. the optimized alt-psm mark is used as a measurement mark to retrieve coma aberration from the projection optics in lithographic tools. in comparison with an ordinary alt-psm mark with its phase width being a half its pitch, the measurement accuracies of z(7) and z(14) apparently increase. (c) 2009 optical society of america |
| 资助信息 | shanghai commission of science and technology (scst) [07jc14056]; national engineering research center for lithographic equipment (nercle), china |
| 语种 | 英语 |
| 公开日期 | 2009-09-18 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/2370]  |
| 专题 | 上海光学精密机械研究所_信息光学开放实验室 |
| 推荐引用方式 GB/T 7714 | Qiu Zicheng,Wang XC,Yuan Qiongyan,et al. Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width[J]. appl. optics,2009,48(2):261, 269. |
| APA | Qiu Zicheng,王向朝,Yuan Qiongyan,&Wang Fan.(2009).Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width.appl. optics,48(2),261. |
| MLA | Qiu Zicheng,et al."Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width".appl. optics 48.2(2009):261. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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