Even aberration measurement of lithographic projection system based on optimized phase-shifting marks
文献类型：期刊论文
| 作者 | Yuan Qiongyan ; Wang XC(王向朝) ; Qiu Zicheng ; Wang Fan ; Ma MY(马明英) |
| 刊名 | microelectron. eng.
 |
| 出版日期 | 2009 |
| 卷号 | 86期号:1页码:78 |
| 关键词 | Lithography Projection optics Spherical aberration Astigmatism Zernike coefficients |
| ISSN号 | 0167-9317 |
| 中文摘要 | in the present paper, we propose a novel method for measuring the even aberrations of lithographic projection optics by use of optimized phase-shifting marks on the test mask. the line/space ratio of the phase-shifting marks is optimized to obtain the maximum sensitivities of zernike coefficients corresponding to even aberrations. spherical aberration and astigmatism can be calculated from the focus shifts of phase-shifting gratings oriented at 0 degrees, 45 degrees, 90 degrees and 135 degrees at multiple illumination settings. the prolith simulation results show that, the measurement accuracy of spherical aberration and astigmatism obviously increase, after the optimization of the measurement mark. (c) 2008 elsevier b.v. all rights reserved. |
| 资助信息 | key basic research program of science and technology commission of shanghai municipality [07jc14056]; national natural science foundation of china [60578051]; nercle (national engineering research center for lithographic equipment, china) |
| 语种 | 英语 |
| 公开日期 | 2009-09-18 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/2372]  |
| 专题 | 上海光学精密机械研究所_信息光学开放实验室 |
| 推荐引用方式 GB/T 7714 | Yuan Qiongyan,Wang XC,Qiu Zicheng,et al. Even aberration measurement of lithographic projection system based on optimized phase-shifting marks[J]. microelectron. eng.,2009,86(1):78, 82. |
| APA | Yuan Qiongyan,王向朝,Qiu Zicheng,Wang Fan,&马明英.(2009).Even aberration measurement of lithographic projection system based on optimized phase-shifting marks.microelectron. eng.,86(1),78. |
| MLA | Yuan Qiongyan,et al."Even aberration measurement of lithographic projection system based on optimized phase-shifting marks".microelectron. eng. 86.1(2009):78. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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