Impact of polarized illumination on high NA imaging in ArF immersion lithography at 45 nm node
文献类型：期刊论文
| 作者 | Yuan Qiongyan ; Wang XC(王向朝) ; Qiu Zicheng |
| 刊名 | optik
 |
| 出版日期 | 2009 |
| 卷号 | 120期号:7页码:325 |
| 关键词 | Immersion lithography Polarized illumination Normalized image log slope Exposure defocus window |
| ISSN号 | 0030-4026 |
| 中文摘要 | immersion lithography has been considered as the mainstream technology to extend the feasibility of optical lithography to further technology nodes. using proper polarized illumination in an immersion lithographic tool is a powerful means to enhance the image quality and process capability for high numerical aperture (na) imaging. in this paper, the impact of polarized illumination on high na imaging in arf immersion lithography for 45 nm dense lines and semi-dense lines is studied by prolith simulation. the normalized image log slope (nils) and exposure defocus (ed) window are simulated under various polarized illumination modes, and the impact of polarized illumination on image quality and process latitude is analyzed. (c) 2007 elsevier gmbh. all rights reserved. |
| 资助信息 | national natural science foundation of china [60578051] |
| 语种 | 英语 |
| WOS记录号 | WOS:000264870700004 |
| 公开日期 | 2009-09-18 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/2382]  |
| 专题 | 上海光学精密机械研究所_信息光学开放实验室 |
| 推荐引用方式 GB/T 7714 | Yuan Qiongyan,Wang XC,Qiu Zicheng. Impact of polarized illumination on high NA imaging in ArF immersion lithography at 45 nm node[J]. optik,2009,120(7):325, 329. |
| APA | Yuan Qiongyan,王向朝,&Qiu Zicheng.(2009).Impact of polarized illumination on high NA imaging in ArF immersion lithography at 45 nm node.optik,120(7),325. |
| MLA | Yuan Qiongyan,et al."Impact of polarized illumination on high NA imaging in ArF immersion lithography at 45 nm node".optik 120.7(2009):325. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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