Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations
文献类型：期刊论文
| 作者 | Zicheng Qiu ; Xiangzhao Wang ; Qunyu Bi ; Qiongyan Yuan ; Bo Peng ; and Lifeng Duan |
| 刊名 | applied optics
 |
| 出版日期 | 2009-07-01 |
| 卷号 | 48期号:19页码:3654-3663 |
| 合作状况 | 其它 |
| 学科主题 | 物理光学 |
| 收录类别 | 其他 |
| 语种 | 中文 |
| 公开日期 | 2010-04-19 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/6345]  |
| 专题 | 上海光学精密机械研究所_信息光学开放实验室 |
| 推荐引用方式 GB/T 7714 | Zicheng Qiu,Xiangzhao Wang,Qunyu Bi,et al. Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations[J]. applied optics,2009,48(19):3654-3663. |
| APA | Zicheng Qiu,Xiangzhao Wang,Qunyu Bi,Qiongyan Yuan,Bo Peng,&and Lifeng Duan.(2009).Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations.applied optics,48(19),3654-3663. |
| MLA | Zicheng Qiu,et al."Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations".applied optics 48.19(2009):3654-3663. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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