Deep silicon grating as high-extinction-ratio polarizing beam splitter
文献类型：期刊论文
| 作者 | Jijun Feng ; Changhe Zhou ; Bo Wang ; Jiangjun Zheng |
| 刊名 | chinese optics letters
 |
| 出版日期 | 2009-04-10 |
| 卷号 | 7期号:4页码:324-328 |
| 合作状况 | 其它 |
| 中文摘要 | a deep binary silicon grating as high-extinction-ratio reflective polarizing beam splitter (pbs) at the wavelength of 1550 nm is presented. the design is based on the phenomenon of total internal reflection (tir) by using the rigorous coupled wave analysis (rcwa). the extinction ratio of the rectangular pbs grating can reach 2.5×105 with the optimum grating period of 397 nm and groove depth of 1.092 μm. the effciencies of tm-polarized wave in the 0th order and te-polarized wave in the −1st order can both reach unity at the littrow angle. holographic recording technology and inductively coupled plasma (icp) etching could be used to fabricate the silicon pbs grating. |
| 学科主题 | 光电子技术 |
| 收录类别 | SCI+EI |
| 语种 | 中文 |
| 公开日期 | 2010-05-14 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/6832]  |
| 专题 | 上海光学精密机械研究所_信息光学开放实验室 |
| 推荐引用方式 GB/T 7714 | Jijun Feng,Changhe Zhou,Bo Wang,et al. Deep silicon grating as high-extinction-ratio polarizing beam splitter[J]. chinese optics letters,2009,7(4):324-328. |
| APA | Jijun Feng,Changhe Zhou,Bo Wang,&Jiangjun Zheng.(2009).Deep silicon grating as high-extinction-ratio polarizing beam splitter.chinese optics letters,7(4),324-328. |
| MLA | Jijun Feng,et al."Deep silicon grating as high-extinction-ratio polarizing beam splitter".chinese optics letters 7.4(2009):324-328. |
入库方式： OAI收割
来源：上海光学精密机械研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。