Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography
文献类型：期刊论文
| 作者 | Li, Yanli; Yan, Wei; Hu, Song; Feng, JinHua; Wang, Jian |
| 刊名 | IEEE PHOTONICS JOURNAL
 |
| 出版日期 | 2016-02-01 |
| 卷号 | 8期号:1 |
| 关键词 | Focusing gratings lithography fringe analysis |
| ISSN号 | 1943-0655 |
| 英文摘要 | Focusing technique is the key factor in improving the resolution of projection lithography. In order to achieve high accuracy of focusing on the nanometer level, we present a focusing method based on dual-channel light intensity modulation. Two superposed grating fringes are formed with a phase difference of pi/2. The shift of the wafer can be resolved by the phase variation of corresponding fringes. The conventional focusing method with light intensity modulation is influenced by disturbing effects such as fluctuations of the light intensity and stray light. These adverse factors are overcome by the signal ratio of two channels with the same optical components. The focusing accuracy in our experiments is +/- 8 nm. |
| WOS标题词 | Science & Technology ; Technology ; Physical Sciences |
| 类目[WOS] | Engineering, Electrical & Electronic ; Optics ; Physics, Applied |
| 研究领域[WOS] | Engineering ; Optics ; Physics |
| 关键词[WOS] | GRATINGS |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000367824400005 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3828]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Li, Yanli,Yan, Wei,Hu, Song,et al. Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography[J]. IEEE PHOTONICS JOURNAL,2016,8(1). |
| APA | Li, Yanli,Yan, Wei,Hu, Song,Feng, JinHua,&Wang, Jian.(2016).Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography.IEEE PHOTONICS JOURNAL,8(1). |
| MLA | Li, Yanli,et al."Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography".IEEE PHOTONICS JOURNAL 8.1(2016). |
入库方式： OAI收割
来源：光电技术研究所
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