磷酸盐激光玻璃的化学机械抛光
文献类型：期刊论文
| ; | |
| 作者 | 张宝安 ; 朱健强 ; 樊全堂 |
| 刊名 | 中国激光
 |
| 出版日期 | 2007 |
| 卷号 | 34期号:8页码:1151 |
| 关键词 | 材料 materials 激光玻璃 laser glass 光学加工 optical processing 抛光液 polishing slurry |
| ISSN号 | 0258-7025 |
| 其他题名 | Chemical-Mechanical Polishing of Phosphate Laser Glass |
| 中文摘要 | 从磷酸盐激光玻璃的成分和结构出发,分析了其化学机械抛光(CMP)机制。通过实验验证了磷酸盐激光玻璃对抛光液pH值具有较强的选择性,在微酸性和中性条件下磷酸盐激光玻璃具有较高的抛光效率,在抛光液中添加pH值调节添加剂会保持抛光环境的酸碱性从而影响抛光效率和抛光质量。通过对pH值和抛光剂浓度的控制获得了均方根(RMS)优于0.6 nm的磷酸盐激光玻璃的超光滑表面。; Embarked from the component and structure of phosphate laser glass, its chemical-mechanical polishing (CMP) mechanism is analyzed. Through experiment, it is demonstrated that the phosphate laser glass has strong selectivity to polishing solution pH value and has high polishing efficiency under slight acidic or neutral condition. By adding pH value adjustment additive in the polishing slurry, the acidity of polishing environment is maintained, as well as the polishing efficiency and polishing quality. An ultra smooth surface of phosphate laser glass with root-mean-square (RMS) 0.6 nm is obtained, through controlling the pH value and density of polishing solution. |
| 分类号 | TN244 |
| 收录类别 | ei |
| 语种 | 中文 |
| 公开日期 | 2009-09-18 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/3176]  |
| 专题 | 上海光学精密机械研究所_高功率激光物理国家实验室 |
| 推荐引用方式 GB/T 7714 | 张宝安,朱健强,樊全堂. 磷酸盐激光玻璃的化学机械抛光, Chemical-Mechanical Polishing of Phosphate Laser Glass[J]. 中国激光,2007,34(8):1151, 1154. |
| APA | 张宝安,朱健强,&樊全堂.(2007).磷酸盐激光玻璃的化学机械抛光.中国激光,34(8),1151. |
| MLA | 张宝安,et al."磷酸盐激光玻璃的化学机械抛光".中国激光 34.8(2007):1151. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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