Photodegradation of diphenylarsinic acid by UV-C light: Implication for its remediation
文献类型：期刊论文
| 作者 | Wang, AA; Teng, Y; Hu, XF ; Wu, LH; Huang, YJ; Luo, YM; Christie, P
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| 刊名 | JOURNAL OF HAZARDOUS MATERIALS
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| 出版日期 | 2016-05-05 |
| 卷号 | 308页码:199-207 |
| 关键词 | Diphenylarsinic acid Photodegradation Electron paramagnetic resonance Pseudo-first-order kinetics |
| ISSN号 | 0304-3894 |
| 产权排序 | [Wang, Anan; Teng, Ying; Wu, Longhua; Huang, Yujuan; Luo, Yongming; Christie, Peter] Chinese Acad Sci, Inst Soil Sci, Key Lab Soil Environm & Pollut Remediat, Nanjing 210008, Jiangsu, Peoples R China; [Hu, Xuefeng; Luo, Yongming] Chinese Acad Sci, Yantai Inst Coastal Zone Res, Key Lab Coastal Zone Environm Processes & Ecol Re, Yantai 264003, Peoples R China |
| 通讯作者 | Luo, YM (reprint author), Chinese Acad Sci, Inst Soil Sci, Key Lab Soil Environm & Pollut Remediat, Nanjing 210008, Jiangsu, Peoples R China. ymluo@yic.ac.cn |
| 英文摘要 | Diphenylarsinic acid (DPAA) is a major contaminant in environments polluted by chemical weapons and abandoned after World Wars I and II and poses high risks to biota but remediation methods for this contaminant are rare. Here, the photodegradtion of DPAA was studied under high-pressure Hg lamp irradiation. DPAA was degraded completely into inorganic arsenic species in 30 min under UV-C irradiation. The photodegradation of DPAA depended mainly on its direct photolysis through excited-state DPAA. By contrast, the generation of O-1(2) during the photodegradation of DPAA was confirmed by electron paramagnetic resonance (EPR) studies, but O-1(2) had little effect on the photodegradation of DPAA. Phtotodegradation of DPAA was also studied in soil leachates and groundwater and the photolytic rate of DPAA was controlled by the total organic carbon (TOC) content in soil leachates and by the NO3- concentration in groundwater. Finally, studies on the effects of common solutes on the photodegradation of DPAA show that Cl- can increase the photolytic rate of DPAA by prolonging the lifetime of excited state DPAA. Moreover, NO3-, NO2-, and humic acid (HA) can decrease the photolytic rate of DPAA by suppressing the production of excited-state DPAA. This research shows the detailed mechanism of DPAA photodegradation and provides a new and effective method for DPAA decontamination. (C) 2016 Elsevier B.V. All rights reserved. |
| 研究领域[WOS] | Engineering ; Environmental Sciences & Ecology |
| 关键词[WOS] | CHEMICAL WARFARE AGENTS ; ZEA-MAYS L. ; PHOTOCHEMICAL DEGRADATION ; ORGANIC-MATTER ; PHENYLARSONIC ACID ; ADVANCED OXIDATION ; AQUEOUS-SOLUTION ; ARSANILIC ACID ; BY-PRODUCTS ; WATER |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000374803600025 |
| 源URL | [http://ir.yic.ac.cn/handle/133337/17051]  |
| 专题 | 烟台海岸带研究所_中科院海岸带环境过程与生态修复重点实验室 |
| 作者单位 | 1.Chinese Acad Sci, Inst Soil Sci, Key Lab Soil Environm & Pollut Remediat 2.Chinese Acad Sci, Yantai Inst Coastal Zone Res, Key Lab Coastal Zone Environm Processes & Ecol Re |
| 推荐引用方式 GB/T 7714 | Wang, AA,Teng, Y,Hu, XF,et al. Photodegradation of diphenylarsinic acid by UV-C light: Implication for its remediation[J]. JOURNAL OF HAZARDOUS MATERIALS,2016,308:199-207. |
| APA | Wang, AA.,Teng, Y.,Hu, XF.,Wu, LH.,Huang, YJ.,...&Christie, P.(2016).Photodegradation of diphenylarsinic acid by UV-C light: Implication for its remediation.JOURNAL OF HAZARDOUS MATERIALS,308,199-207. |
| MLA | Wang, AA,et al."Photodegradation of diphenylarsinic acid by UV-C light: Implication for its remediation".JOURNAL OF HAZARDOUS MATERIALS 308(2016):199-207. |
入库方式： OAI收割
来源：烟台海岸带研究所
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