中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Light-induced enhancement of the minority carrier lifetime in boron-doped Czochralski silicon passivated by doped silicon nitride

文献类型:期刊论文

作者Wang, Hongzhe ; Chen, Chao ; Pan, Miao ; Sun, Yiling ; Yang, Xi
刊名APPLIED SURFACE SCIENCE
出版日期2015
卷号357页码:1991-1995
ISSN号0169-4332
公开日期2016-09-18
源URL[http://ir.nimte.ac.cn/handle/174433/12251]  
专题宁波材料技术与工程研究所_2015专题
推荐引用方式
GB/T 7714
Wang, Hongzhe,Chen, Chao,Pan, Miao,et al. Light-induced enhancement of the minority carrier lifetime in boron-doped Czochralski silicon passivated by doped silicon nitride[J]. APPLIED SURFACE SCIENCE,2015,357:1991-1995.
APA Wang, Hongzhe,Chen, Chao,Pan, Miao,Sun, Yiling,&Yang, Xi.(2015).Light-induced enhancement of the minority carrier lifetime in boron-doped Czochralski silicon passivated by doped silicon nitride.APPLIED SURFACE SCIENCE,357,1991-1995.
MLA Wang, Hongzhe,et al."Light-induced enhancement of the minority carrier lifetime in boron-doped Czochralski silicon passivated by doped silicon nitride".APPLIED SURFACE SCIENCE 357(2015):1991-1995.

入库方式: OAI收割

来源:宁波材料技术与工程研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。