Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films
文献类型：期刊论文
| 作者 | Meng, Fanping ; Peng, Shou ; Xu, Genbao ; Wang, Yun ; Ge, Fangfang ; Huang, Feng |
| 刊名 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
 |
| 出版日期 | 2015 |
| 卷号 | 33期号:6页码:- |
| ISSN号 | 0734-2101 |
| 公开日期 | 2016-09-18 |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/12282]  |
| 专题 | 宁波材料技术与工程研究所_2015专题 |
| 推荐引用方式 GB/T 7714 | Meng, Fanping,Peng, Shou,Xu, Genbao,et al. Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2015,33(6):-. |
| APA | Meng, Fanping,Peng, Shou,Xu, Genbao,Wang, Yun,Ge, Fangfang,&Huang, Feng.(2015).Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,33(6),-. |
| MLA | Meng, Fanping,et al."Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 33.6(2015):-. |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。