Microstructure and electrochemical properties of nitrogen-doped DLC films deposited by PECVD technique
文献类型：期刊论文
| 作者 | Zhou, Quekai ; Ke, Peiling ; Li, Xiaowei ; Zou, Yousheng ; Wang, Aiying |
| 刊名 | APPLIED SURFACE SCIENCE
 |
| 出版日期 | 2015 |
| 卷号 | 329页码:281-286 |
| ISSN号 | 0169-4332 |
| 公开日期 | 2016-09-18 |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/12594]  |
| 专题 | 宁波材料技术与工程研究所_2015专题 |
| 推荐引用方式 GB/T 7714 | Zhou, Quekai,Ke, Peiling,Li, Xiaowei,et al. Microstructure and electrochemical properties of nitrogen-doped DLC films deposited by PECVD technique[J]. APPLIED SURFACE SCIENCE,2015,329:281-286. |
| APA | Zhou, Quekai,Ke, Peiling,Li, Xiaowei,Zou, Yousheng,&Wang, Aiying.(2015).Microstructure and electrochemical properties of nitrogen-doped DLC films deposited by PECVD technique.APPLIED SURFACE SCIENCE,329,281-286. |
| MLA | Zhou, Quekai,et al."Microstructure and electrochemical properties of nitrogen-doped DLC films deposited by PECVD technique".APPLIED SURFACE SCIENCE 329(2015):281-286. |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
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