中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
n-type Polycrystalline Si Thick Films Deposited on SiNx-coated Metallurgical Grade Si Substrates

文献类型:期刊论文

作者Zhang, Hongliang ; Zhu, Liqiang ; Guo, Liqiang ; Liu, Yanghui ; Wan, Qing
刊名JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
出版日期2015
卷号31期号:1
ISSN号1005-0302
公开日期2016-09-18
源URL[http://ir.nimte.ac.cn/handle/174433/12844]  
专题宁波材料技术与工程研究所_2015专题
推荐引用方式
GB/T 7714
Zhang, Hongliang,Zhu, Liqiang,Guo, Liqiang,et al. n-type Polycrystalline Si Thick Films Deposited on SiNx-coated Metallurgical Grade Si Substrates[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2015,31(1).
APA Zhang, Hongliang,Zhu, Liqiang,Guo, Liqiang,Liu, Yanghui,&Wan, Qing.(2015).n-type Polycrystalline Si Thick Films Deposited on SiNx-coated Metallurgical Grade Si Substrates.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,31(1).
MLA Zhang, Hongliang,et al."n-type Polycrystalline Si Thick Films Deposited on SiNx-coated Metallurgical Grade Si Substrates".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 31.1(2015).

入库方式: OAI收割

来源:宁波材料技术与工程研究所

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