Stress measurement at the interface between a Si substrate and diamond-like carbon/Cr/W films by the electronic backscatter diffraction method
文献类型：期刊论文
| 作者 | Zhou, Liqi ; Xu, Guofu ; Li, Xu ; Wang, Xinwei ; Ren, Lingling ; Wang, Aiying ; Tao, Xingfu |
| 刊名 | APPLIED PHYSICS EXPRESS
 |
| 出版日期 | 2016 |
| 卷号 | 9期号:2 |
| ISSN号 | 1882-0778 |
| 公开日期 | 2016-09-18 |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/13110]  |
| 专题 | 宁波材料技术与工程研究所_2016专题 |
| 推荐引用方式 GB/T 7714 | Zhou, Liqi,Xu, Guofu,Li, Xu,et al. Stress measurement at the interface between a Si substrate and diamond-like carbon/Cr/W films by the electronic backscatter diffraction method[J]. APPLIED PHYSICS EXPRESS,2016,9(2). |
| APA | Zhou, Liqi.,Xu, Guofu.,Li, Xu.,Wang, Xinwei.,Ren, Lingling.,...&Tao, Xingfu.(2016).Stress measurement at the interface between a Si substrate and diamond-like carbon/Cr/W films by the electronic backscatter diffraction method.APPLIED PHYSICS EXPRESS,9(2). |
| MLA | Zhou, Liqi,et al."Stress measurement at the interface between a Si substrate and diamond-like carbon/Cr/W films by the electronic backscatter diffraction method".APPLIED PHYSICS EXPRESS 9.2(2016). |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
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