Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films
文献类型：期刊论文
| 作者 | Xiao, Xiudi1,2; Miao, Lei1; Zhang, Ming1; Xu, Gang1; Shao, Jianda2; Fan, Zhengxiu2 |
| 刊名 | journal of nanoscience and nanotechnology
 |
| 出版日期 | 2013-02-01 |
| 卷号 | 13期号:2页码:824-828 |
| 关键词 | TiO2 Thin Films Residual Stress Anisotropic Laser-Induced Damage Raman Spectra |
| 英文摘要 | the residual stress and laser-induced damage threshold (lidt) of tio2 sculptured thin films prepared by glancing angle electron beam evaporation were studied. uv-vis-nir spectra and optical interferometer were employed to characterize the optical and mechanical properties, respectively. optical microscopy and raman spectra were used to observe damage morphology and analyze damage microstructure, respectively. it was found that the residual stress changed from compressive into tensile with increasing deposition angle. the lidt was anisotropic with p- and s-polarization light, which was due to the anisotropic nanostructure and optical properties. simultaneously, an optimum deposition angle for the maximum threshold of tio2 film was about 60 degrees. the mechanism of laser-induced damage was thermal in nature. the process of thermal damage with crystallization is proved by raman spectra. |
| WOS标题词 | science & technology ; physical sciences ; technology |
| 类目[WOS] | chemistry, multidisciplinary ; nanoscience & nanotechnology ; materials science, multidisciplinary ; physics, applied ; physics, condensed matter |
| 研究领域[WOS] | chemistry ; science & technology - other topics ; materials science ; physics |
| 关键词[WOS] | glancing angle deposition ; optical-properties ; coatings ; microstructure ; silicon |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000318254500019 |
| 源URL | [http://ir.giec.ac.cn/handle/344007/10044]  |
| 专题 | 中国科学院广州能源研究所 |
| 作者单位 | 1.Chinese Acad Sci, Guangzhou Inst Energy Convers, Key Lab Renewable Energy & Gas Hydrates, Guangzhou 510640, Guangdong, Peoples R China 2.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Xiao, Xiudi,Miao, Lei,Zhang, Ming,et al. Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films[J]. journal of nanoscience and nanotechnology,2013,13(2):824-828. |
| APA | Xiao, Xiudi,Miao, Lei,Zhang, Ming,Xu, Gang,Shao, Jianda,&Fan, Zhengxiu.(2013).Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films.journal of nanoscience and nanotechnology,13(2),824-828. |
| MLA | Xiao, Xiudi,et al."Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films".journal of nanoscience and nanotechnology 13.2(2013):824-828. |
入库方式： OAI收割
来源：广州能源研究所
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