Fluoride coatings for vacuum ultraviolet reflection filters
文献类型：期刊论文
| 作者 | Guo, Chun; Kong, Mingdong; Lin, Dawei; Li, Bincheng |
| 刊名 | APPLIED OPTICS
 |
| 出版日期 | 2015 |
| 卷号 | 54期号:35页码:10498-10503 |
| ISSN号 | 1559-128X |
| 中文摘要 | LaF3/MgF2 reflection filters with a high spectral-discrimination capacity of the atomic-oxygen lines at 130.4 and 135.6 nm, which were employed in vacuum ultraviolet imagers, were prepared by molybdenum-boat thermal evaporation. The optical properties of reflection filters were characterized by a high-precision vacuum ultraviolet spectrophotometer. The vulnerability of the filter's microstructures to environmental contamination and the recovery of the optical properties of the stored filter samples with ultraviolet ozone cleaning were experimentally demonstrated. For reflection filters with the optimized nonquarter-wave multilayer structures, the reflectance ratios R-135.6nm/R-130.4nm of 92.7 and 20.6 were achieved for 7 degrees and 45 degrees angles of incidence, respectively. On the contrary, R135.6nm/R130.4nm ratio of 12.4 was obtained for a reflection filter with a standard p-stack multilayer structure with H/L = 1/4 at 7 degrees AOI. (C) 2015 Optical Society of America |
| 英文摘要 | LaF3/MgF2 reflection filters with a high spectral-discrimination capacity of the atomic-oxygen lines at 130.4 and 135.6 nm, which were employed in vacuum ultraviolet imagers, were prepared by molybdenum-boat thermal evaporation. The optical properties of reflection filters were characterized by a high-precision vacuum ultraviolet spectrophotometer. The vulnerability of the filter's microstructures to environmental contamination and the recovery of the optical properties of the stored filter samples with ultraviolet ozone cleaning were experimentally demonstrated. For reflection filters with the optimized nonquarter-wave multilayer structures, the reflectance ratios R-135.6nm/R-130.4nm of 92.7 and 20.6 were achieved for 7 degrees and 45 degrees angles of incidence, respectively. On the contrary, R135.6nm/R130.4nm ratio of 12.4 was obtained for a reflection filter with a standard p-stack multilayer structure with H/L = 1/4 at 7 degrees AOI. (C) 2015 Optical Society of America |
| 学科主题 | THIN-FILMS; 193 NM; BOAT EVAPORATION; NARROW-BAND; MICROSTRUCTURE; MGF2 |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000366605900029 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/6638]  |
| 专题 | 光电技术研究所_薄膜光学技术研究室（十一室） |
| 推荐引用方式 GB/T 7714 | Guo, Chun,Kong, Mingdong,Lin, Dawei,et al. Fluoride coatings for vacuum ultraviolet reflection filters[J]. APPLIED OPTICS,2015,54(35):10498-10503. |
| APA | Guo, Chun,Kong, Mingdong,Lin, Dawei,&Li, Bincheng.(2015).Fluoride coatings for vacuum ultraviolet reflection filters.APPLIED OPTICS,54(35),10498-10503. |
| MLA | Guo, Chun,et al."Fluoride coatings for vacuum ultraviolet reflection filters".APPLIED OPTICS 54.35(2015):10498-10503. |
入库方式： OAI收割
来源：光电技术研究所
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