Effect of Near-Field Diffraction in Photolithography of Hexagonal Arrays for Dichroic Filters
文献类型：期刊论文
| 作者 | Zhou, Shaolin1; Liu, Junbo2; Deng, Qian2; Xie, Changqing3; Chan, Mansun4 |
| 刊名 | IEEE PHOTONICS JOURNAL
 |
| 出版日期 | 2016-08-01 |
| 卷号 | 8期号:4 |
| 关键词 | Diffraction photolithography terahertz filters hexagonal array |
| ISSN号 | 1943-0655 |
| 英文摘要 | Dichroic filters with the hexagonal lattice of circular holes are used as fundamental devices for frequency selection from the infrared to the terahertz (THz) region. In the fabrication of such a high-density periodic array by the contact-mode photolithography, the depth of focus (DOF) turns out to be tremendously shrunk for ideal pattern contrast. In this paper, near-field diffraction of the hexagonal lattice was analytically treated, and the tolerant DOF was estimated in terms of the Talbot distance in photolithography. Affine transformation was applied to the rectangular lattice to derive the near-field diffraction intensity, and a process factor k(2) was introduced to predetermine the practical DOF in photolithography. Numerical calculations according to the analytic predication agree well with the preliminary experiments, where the intensity evolved drastically to suppress the limited DOF zone. It was also revealed that the practical DOF can be improved by eliminating the high-order diffraction or using the photoresist with higher threshold energy to enhance the process factor. The analytic and experimental results can be used to optimize the high-contrast patterning by optical lithography. |
| WOS标题词 | Science & Technology ; Technology ; Physical Sciences |
| 类目[WOS] | Engineering, Electrical & Electronic ; Optics ; Physics, Applied |
| 研究领域[WOS] | Engineering ; Optics ; Physics |
| 关键词[WOS] | TIME-DOMAIN SPECTROSCOPY ; TERAHERTZ SPECTROSCOPY ; SECURITY APPLICATIONS ; BANDPASS-FILTERS ; LITHOGRAPHY ; WAVELENGTHS ; FABRICATION ; SPECTRUM ; LIGHT |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000381489500022 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3921]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.South China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510640, Guangdong, Peoples R China 2.Chinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu 610209, Peoples R China 3.Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China 4.Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Kowloon, Hong Kong, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhou, Shaolin,Liu, Junbo,Deng, Qian,et al. Effect of Near-Field Diffraction in Photolithography of Hexagonal Arrays for Dichroic Filters[J]. IEEE PHOTONICS JOURNAL,2016,8(4). |
| APA | Zhou, Shaolin,Liu, Junbo,Deng, Qian,Xie, Changqing,&Chan, Mansun.(2016).Effect of Near-Field Diffraction in Photolithography of Hexagonal Arrays for Dichroic Filters.IEEE PHOTONICS JOURNAL,8(4). |
| MLA | Zhou, Shaolin,et al."Effect of Near-Field Diffraction in Photolithography of Hexagonal Arrays for Dichroic Filters".IEEE PHOTONICS JOURNAL 8.4(2016). |
入库方式： OAI收割
来源：光电技术研究所
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