Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review
文献类型：期刊论文
| 作者 | Wang, Changtao; Zhang, Wei; Zhao, Zeyu; Wang, Yanqin; Gao, Ping; Luo, Yunfei; Luo, Xiangang |
| 刊名 | MICROMACHINES
 |
| 出版日期 | 2016-07-01 |
| 卷号 | 7期号:7 |
| 关键词 | surface plasmon polaritons bulk plasmon polaritons diffraction limit subwavelength optics near-field optics metamaterial super resolution nano optical lithography nanostructure fabrication |
| ISSN号 | 2072-666X |
| 英文摘要 | The rapid development of nanotechnologies and sciences has led to the great demand for novel lithography methods allowing large area, low cost and high resolution nano fabrications. Characterized by unique sub-diffraction optical features like propagation with an ultra-short wavelength and great field enhancement in subwavelength regions, surface plasmon polaritons (SPPs), including surface plasmon waves, bulk plasmon polaritons (BPPs) and localized surface plasmons (LSPs), have become potentially promising candidates for nano lithography. In this paper, investigations into plasmonic lithography in the manner of point-to-point writing, interference and imaging were reviewed in detail. Theoretical simulations and experiments have demonstrated plasmonic lithography resolution far beyond the conventional diffraction limit, even with ultraviolet light sources and single exposure performances. Half-pitch resolution as high as 22 nm (similar to 1/17 light wavelength) was observed in plasmonic lens imaging lithography. Moreover, not only the overview of state-of-the-art results, but also the physics behind them and future research suggestions are discussed as well. |
| WOS标题词 | Science & Technology ; Technology |
| 类目[WOS] | Nanoscience & Nanotechnology ; Instruments & Instrumentation |
| 研究领域[WOS] | Science & Technology - Other Topics ; Instruments & Instrumentation |
| 关键词[WOS] | CIRCULAR-POLARIZATION ANALYZER ; OFF-AXIS ILLUMINATION ; PLANAR ANISOTROPIC METAMATERIALS ; HIGH-ASPECT-RATIO ; NEAR-FIELD ; INTERFERENCE LITHOGRAPHY ; NEGATIVE REFRACTION ; SURFACE-PLASMONS ; SUPERLENS LITHOGRAPHY ; VISIBLE FREQUENCIES |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000380770000013 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/6472]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Wang, Changtao,Zhang, Wei,Zhao, Zeyu,et al. Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review[J]. MICROMACHINES,2016,7(7). |
| APA | Wang, Changtao.,Zhang, Wei.,Zhao, Zeyu.,Wang, Yanqin.,Gao, Ping.,...&Luo, Xiangang.(2016).Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review.MICROMACHINES,7(7). |
| MLA | Wang, Changtao,et al."Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review".MICROMACHINES 7.7(2016). |
入库方式： OAI收割
来源：光电技术研究所
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