Extended dual-grating alignment method for optical projection lithography
文献类型：期刊论文
| 作者 | Wangfu Chen; Wei Yan; Song Hu; Yong Yang; Shaolin Zhou |
| 刊名 | Applied Optics
 |
| 出版日期 | 2010 |
| 卷号 | 49期号:4页码:708-713 |
| 通讯作者 | Wangfu Chen |
| 中文摘要 | Since accurate alignment is essential for projection lithography, an extended dual-grating based alignment scheme is proposed. This method is an extension of the basic dual-grating alignment model, the mechanism of which is explained to make it clear how the extended scheme performs in projection lithography. The framework of the extended alignment scheme for projection lithography is constructed, and the process of key parameter determination is then detailed. In both cases, a tiny shift of the wafer during the alignment process can be resolved by a conspicuous displacement or phase variation of corresponding fringes. Analytical results indicate that alignment is independent of the gap between wafer and mask, disturbance from the fluctuation in illumination can be neglected, and alignment resolution in subnanometers can be realized with this scheme. |
| 英文摘要 | Since accurate alignment is essential for projection lithography, an extended dual-grating based alignment scheme is proposed. This method is an extension of the basic dual-grating alignment model, the mechanism of which is explained to make it clear how the extended scheme performs in projection lithography. The framework of the extended alignment scheme for projection lithography is constructed, and the process of key parameter determination is then detailed. In both cases, a tiny shift of the wafer during the alignment process can be resolved by a conspicuous displacement or phase variation of corresponding fringes. Analytical results indicate that alignment is independent of the gap between wafer and mask, disturbance from the fluctuation in illumination can be neglected, and alignment resolution in subnanometers can be realized with this scheme. |
| 语种 | 英语 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7232]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 中国科学院光电技术研究所 |
| 推荐引用方式 GB/T 7714 | Wangfu Chen,Wei Yan,Song Hu,et al. Extended dual-grating alignment method for optical projection lithography[J]. Applied Optics,2010,49(4):708-713. |
| APA | Wangfu Chen,Wei Yan,Song Hu,Yong Yang,&Shaolin Zhou.(2010).Extended dual-grating alignment method for optical projection lithography.Applied Optics,49(4),708-713. |
| MLA | Wangfu Chen,et al."Extended dual-grating alignment method for optical projection lithography".Applied Optics 49.4(2010):708-713. |
入库方式： OAI收割
来源：光电技术研究所
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