A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment
文献类型：期刊论文
| 作者 | Li, Lanlan1,2; Hu, Song1; Zhao, Lixin1; Ma, Ping1; Li, Jinlong1,2; Zhong, Lingna1,2 |
| 刊名 | Optik
 |
| 出版日期 | 2013 |
| 卷号 | 124期号:24页码:6861-6865 |
| ISSN号 | 00304026 |
| 通讯作者 | Li, L. (lilanlan1022@qq.com) |
| 中文摘要 | Quality of exposures in step and scan lithographic equipment (scanner) highly depends on the synchronization of wafer and reticle stage. In order to increase the synchronization between the two stages, a method of increasing the correlation through reducing the phase difference between the tracking errors of the two stages is presented. Theoretical analysis with respect to application of increasing the correlation coefficients is performed. Validation of this process is verified through simulation and the results indicate that the moving average (MA) and moving standard deviation (MSD) of the synchronization error can be reduced effectively through our method. © 2013 Elsevier GmbH. All rights reserved. |
| 英文摘要 | Quality of exposures in step and scan lithographic equipment (scanner) highly depends on the synchronization of wafer and reticle stage. In order to increase the synchronization between the two stages, a method of increasing the correlation through reducing the phase difference between the tracking errors of the two stages is presented. Theoretical analysis with respect to application of increasing the correlation coefficients is performed. Validation of this process is verified through simulation and the results indicate that the moving average (MA) and moving standard deviation (MSD) of the synchronization error can be reduced effectively through our method. © 2013 Elsevier GmbH. All rights reserved. |
| 学科主题 | Optical instruments - Scanning |
| 收录类别 | SCI ; EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000327685700081 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7280]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 1.Institute Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China 2.University of Chinese Academy of Sciences, Beijing 100039, China |
| 推荐引用方式 GB/T 7714 | Li, Lanlan,Hu, Song,Zhao, Lixin,et al. A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment[J]. Optik,2013,124(24):6861-6865. |
| APA | Li, Lanlan,Hu, Song,Zhao, Lixin,Ma, Ping,Li, Jinlong,&Zhong, Lingna.(2013).A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment.Optik,124(24),6861-6865. |
| MLA | Li, Lanlan,et al."A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment".Optik 124.24(2013):6861-6865. |
入库方式： OAI收割
来源：光电技术研究所
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