Influence of Collimation on Alignment Accuracy in Proximity Lithography
文献类型：期刊论文
| 作者 | Wang, Nan; Jiang, Wei; Zhu, Jiangping; Tang, Yan; Yan, Wei; Tong, Junmin; Hu, Song |
| 刊名 | IEEE PHOTONICS JOURNAL
 |
| 出版日期 | 2014 |
| 卷号 | 6期号:4 |
| ISSN号 | 1943-0655 |
| 通讯作者 | Wang, N (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China. |
| 中文摘要 | The alignment method based on moire imaging has been wildly used for its high accuracy of physical measurement, which utilized the phase of moire fringe to measure the relative linear displacement between the mask and the wafer. However, this method is only theoretically accurate due to the affection of certain parameters, such as the optical beam collimation. In this paper, the influence of collimation on the alignment accuracy is thoroughly analyzed. The theoretical analyses and simulation results indicate that the alignment accuracy, which was observed just behind the test grating, is sensitive to the divergence or convergence angle of incident light. On this basis, the method for the error correction is proposed and confirmed. |
| 英文摘要 | The alignment method based on moire imaging has been wildly used for its high accuracy of physical measurement, which utilized the phase of moire fringe to measure the relative linear displacement between the mask and the wafer. However, this method is only theoretically accurate due to the affection of certain parameters, such as the optical beam collimation. In this paper, the influence of collimation on the alignment accuracy is thoroughly analyzed. The theoretical analyses and simulation results indicate that the alignment accuracy, which was observed just behind the test grating, is sensitive to the divergence or convergence angle of incident light. On this basis, the method for the error correction is proposed and confirmed. |
| 学科主题 | Collimation; moire fringe; lithography alignment |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000342912700013 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7291]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 1.[Wang, Nan 2.Jiang, Wei 3.Tang, Yan 4.Yan, Wei 5.Hu, Song] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China 6.[Wang, Nan] Univ Chinese Acad Sci, Beijing 100039, Peoples R China 7.[Zhu, Jiangping] Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China 8.[Tong, Junmin] Xuchang Vocat & Tech Coll, Xuchang 461000, Peoples R China |
| 推荐引用方式 GB/T 7714 | Wang, Nan,Jiang, Wei,Zhu, Jiangping,et al. Influence of Collimation on Alignment Accuracy in Proximity Lithography[J]. IEEE PHOTONICS JOURNAL,2014,6(4). |
| APA | Wang, Nan.,Jiang, Wei.,Zhu, Jiangping.,Tang, Yan.,Yan, Wei.,...&Hu, Song.(2014).Influence of Collimation on Alignment Accuracy in Proximity Lithography.IEEE PHOTONICS JOURNAL,6(4). |
| MLA | Wang, Nan,et al."Influence of Collimation on Alignment Accuracy in Proximity Lithography".IEEE PHOTONICS JOURNAL 6.4(2014). |
入库方式： OAI收割
来源：光电技术研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。