Nanochannel fabrication by imprinting-induced cracks
文献类型：期刊论文
| 作者 | Xia, Liangping1,2; Zhang, Man2; Yang, Zheng1; Cui, Hongliang1; Yin, Shaoyun1; Hu, Song; Du, Chunlei |
| 刊名 | Applied Physics Letters
 |
| 出版日期 | 2014 |
| 卷号 | 104期号:7页码:073104 |
| ISSN号 | 00036951 |
| 通讯作者 | Du, C. (cldu@cigit.ac.cn) |
| 中文摘要 | A simple and low-cost process of imprinting-induced cracks is proposed to fabricate controllable nanochannel structures with high depth-to-width ratio, in ultraviolet (UV) curable photoresist. The nanochannels are formed by the cracks of UV-curable photoresist due to its volume reduction as a result of solidification, with imprinting induced predesigned crack patterns. The proposed process is demonstrated with a nanochannel structure consisting of a periodically distributed hexagonal 30 nm-width and 100 nm-depth channels, which is fabricated by anodic aluminum oxide template imprinting induced cracks on a thiolene UV-curable photoresist. A finite element analysis provided theoretical foundation for the process, shedding lights on the parameters influencing the process. © 2014 AIP Publishing LLC. |
| 英文摘要 | A simple and low-cost process of imprinting-induced cracks is proposed to fabricate controllable nanochannel structures with high depth-to-width ratio, in ultraviolet (UV) curable photoresist. The nanochannels are formed by the cracks of UV-curable photoresist due to its volume reduction as a result of solidification, with imprinting induced predesigned crack patterns. The proposed process is demonstrated with a nanochannel structure consisting of a periodically distributed hexagonal 30 nm-width and 100 nm-depth channels, which is fabricated by anodic aluminum oxide template imprinting induced cracks on a thiolene UV-curable photoresist. A finite element analysis provided theoretical foundation for the process, shedding lights on the parameters influencing the process. © 2014 AIP Publishing LLC. |
| 学科主题 | Anodic oxidation - Curing - Photoresists |
| 收录类别 | SCI ; EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000332038500056 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7295]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 1.Key Laboratory of Multi-scale Manufacturing Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 400714, China 2.Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu 610209, China |
| 推荐引用方式 GB/T 7714 | Xia, Liangping,Zhang, Man,Yang, Zheng,et al. Nanochannel fabrication by imprinting-induced cracks[J]. Applied Physics Letters,2014,104(7):073104. |
| APA | Xia, Liangping.,Zhang, Man.,Yang, Zheng.,Cui, Hongliang.,Yin, Shaoyun.,...&Du, Chunlei.(2014).Nanochannel fabrication by imprinting-induced cracks.Applied Physics Letters,104(7),073104. |
| MLA | Xia, Liangping,et al."Nanochannel fabrication by imprinting-induced cracks".Applied Physics Letters 104.7(2014):073104. |
入库方式： OAI收割
来源：光电技术研究所
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