A moiré-based four-channel focusing and leveling scheme for projection lithography
文献类型：期刊论文
| 作者 | Di, Chengliang1,2; Yan, Wei1; Hu, Song1; Li, Yanli1; Yin, Didi2; Tang, Yan1; Tong, Junmin |
| 刊名 | IEEE Photonics Journal
 |
| 出版日期 | 2014 |
| 卷号 | 6期号:4页码:6842663 |
| ISSN号 | 19430655 |
| 通讯作者 | Di, C. (chengliangdi@163.com) |
| 中文摘要 | Focusing and leveling are two imperative processes to adjust the wafer onto the ideal focal plane of projection lithography tools. Based on moire´ fringes formed by particularly designed dual-grating marks, the four-channel focusing and leveling scheme is proposed and demonstrated. These relationships between the tilted amount of wafer, the vertical defocusing amount, and the phase distributions of moire´ fringes are deduced. A single-channel experimental setup is constructed to verify the performances of proposed method. Results indicate that the tilted amount and the vertical defocusing amount can be precisely detected with accuracy at 10-4 rad and several nanometers level, respectively, and therefore meet the demand of the high-demanding focusing and leveling processes. © 2014 IEEE. |
| 英文摘要 | Focusing and leveling are two imperative processes to adjust the wafer onto the ideal focal plane of projection lithography tools. Based on moire´ fringes formed by particularly designed dual-grating marks, the four-channel focusing and leveling scheme is proposed and demonstrated. These relationships between the tilted amount of wafer, the vertical defocusing amount, and the phase distributions of moire´ fringes are deduced. A single-channel experimental setup is constructed to verify the performances of proposed method. Results indicate that the tilted amount and the vertical defocusing amount can be precisely detected with accuracy at 10-4 rad and several nanometers level, respectively, and therefore meet the demand of the high-demanding focusing and leveling processes. © 2014 IEEE. |
| 学科主题 | Lithography - Photolithography |
| 收录类别 | SCI ; EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000342912700017 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7296]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 1.State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China 2.University of Chinese Academy of Sciences, Beijing 100049, China 3.Xuchang Vocational and Technical College, Xuchang 461000, China |
| 推荐引用方式 GB/T 7714 | Di, Chengliang,Yan, Wei,Hu, Song,et al. A moiré-based four-channel focusing and leveling scheme for projection lithography[J]. IEEE Photonics Journal,2014,6(4):6842663. |
| APA | Di, Chengliang.,Yan, Wei.,Hu, Song.,Li, Yanli.,Yin, Didi.,...&Tong, Junmin.(2014).A moiré-based four-channel focusing and leveling scheme for projection lithography.IEEE Photonics Journal,6(4),6842663. |
| MLA | Di, Chengliang,et al."A moiré-based four-channel focusing and leveling scheme for projection lithography".IEEE Photonics Journal 6.4(2014):6842663. |
入库方式： OAI收割
来源：光电技术研究所
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