Spectrum-Integral Talbot Effect for UV Photolithography with Extended DOF
文献类型：期刊论文
| 作者 | Liu, Junbo1,2; Zhou, Shaolin3; Hu, Song4; Gao, Hongtao4; He, Yu4; Cheng, Yiguang1,2
|
| 刊名 | IEEE Photonics Technology Letters
 |
| 出版日期 | 2015 |
| 卷号 | 27期号:20页码:2201-2204 |
| ISSN号 | 1041-1135 |
| 中文摘要 | A route of spectrum-integral Talbot lithography (SITL) with extended depth-of-focus (DOF) for microfabrication of periodic structures was explored under broadband incoherent illumination in this letter. The transmitted diffraction fields by different spectral components integrate together to generate the successive periodicity since certain distance along the direction of propagation. The mechanism of DOF extension was derived and numerically elucidated using the spectrum of a practical ultraviolet source. Experiments of proximity lithography in term of the numeric results were performed to record the intensity distributions within the DOF area. Finally, the results reveal the validity of SITL and its potentials in high-fidelity lithography of periodic micropatterns with almost unlimited DOF and thus enhanced resolution. © 2015 IEEE. |
| 英文摘要 | A route of spectrum-integral Talbot lithography (SITL) with extended depth-of-focus (DOF) for microfabrication of periodic structures was explored under broadband incoherent illumination in this letter. The transmitted diffraction fields by different spectral components integrate together to generate the successive periodicity since certain distance along the direction of propagation. The mechanism of DOF extension was derived and numerically elucidated using the spectrum of a practical ultraviolet source. Experiments of proximity lithography in term of the numeric results were performed to record the intensity distributions within the DOF area. Finally, the results reveal the validity of SITL and its potentials in high-fidelity lithography of periodic micropatterns with almost unlimited DOF and thus enhanced resolution. © 2015 IEEE. |
| 学科主题 | Diffraction - Light polarization - Lithography - Microanalysis - Microfabrication - Periodic structures |
| 收录类别 | SCI ; EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000361685200024 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7326]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 1.University of Chinese, Academy of Sciences, Beijing, China 2.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China 3.School of Electronic and Information Engineering, South China University of Technology, Guangzhou, China 4.State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China |
| 推荐引用方式 GB/T 7714 | Liu, Junbo,Zhou, Shaolin,Hu, Song,et al. Spectrum-Integral Talbot Effect for UV Photolithography with Extended DOF[J]. IEEE Photonics Technology Letters,2015,27(20):2201-2204. |
| APA | Liu, Junbo,Zhou, Shaolin,Hu, Song,Gao, Hongtao,He, Yu,&Cheng, Yiguang.(2015).Spectrum-Integral Talbot Effect for UV Photolithography with Extended DOF.IEEE Photonics Technology Letters,27(20),2201-2204. |
| MLA | Liu, Junbo,et al."Spectrum-Integral Talbot Effect for UV Photolithography with Extended DOF".IEEE Photonics Technology Letters 27.20(2015):2201-2204. |
入库方式： OAI收割
来源：光电技术研究所
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