Gap-optimized Moiré phase imaging alignment for proximity lithography
文献类型：期刊论文
| 作者 | Zhu, Jiangping1; Hu, Song2; You, Zhisheng1; Su, Xianyu3 |
| 刊名 | Optical Engineering
 |
| 出版日期 | 2015 |
| 卷号 | 54期号:1页码:17105 |
| ISSN号 | 0091-3286 |
| 通讯作者 | You, Zhisheng |
| 中文摘要 | The proposed four-quadrant Moiré alignment scheme to detect the misalignment between mask and wafer for proximity lithography can achieve the alignment accuracy with nanometer level. When implementing the scheme, however, the distribution of Moiré fringes associated with the mask-wafer gap indeed goes against the alignment, making the gap optimization highly urgent. The optimization model is established, and numerical simulation as well as experimental verification is also provided. Furthermore, an alignment accuracy of ∼3 nm with the illumination wavelength of 632.8 nm is experimentally attained. Simultaneously, the design mechanism of alignment marks for improving the availability of the alignment scheme is discussed. © Society of Photo-Optical Instrumentation Engineers. |
| 英文摘要 | The proposed four-quadrant Moiré alignment scheme to detect the misalignment between mask and wafer for proximity lithography can achieve the alignment accuracy with nanometer level. When implementing the scheme, however, the distribution of Moiré fringes associated with the mask-wafer gap indeed goes against the alignment, making the gap optimization highly urgent. The optimization model is established, and numerical simulation as well as experimental verification is also provided. Furthermore, an alignment accuracy of ∼3 nm with the illumination wavelength of 632.8 nm is experimentally attained. Simultaneously, the design mechanism of alignment marks for improving the availability of the alignment scheme is discussed. © Society of Photo-Optical Instrumentation Engineers. |
| 学科主题 | Lithography - Optimization |
| 收录类别 | SCI ; EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000349442900047 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7328]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 1.Sichuan University, School of Computer Science and Technology, Chengdu, China 2.Chinese Academy of Sciences, State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chengdu, China 3.Sichuan University, School of Electronics and Information, Chengdu, China |
| 推荐引用方式 GB/T 7714 | Zhu, Jiangping,Hu, Song,You, Zhisheng,et al. Gap-optimized Moiré phase imaging alignment for proximity lithography[J]. Optical Engineering,2015,54(1):17105. |
| APA | Zhu, Jiangping,Hu, Song,You, Zhisheng,&Su, Xianyu.(2015).Gap-optimized Moiré phase imaging alignment for proximity lithography.Optical Engineering,54(1),17105. |
| MLA | Zhu, Jiangping,et al."Gap-optimized Moiré phase imaging alignment for proximity lithography".Optical Engineering 54.1(2015):17105. |
入库方式： OAI收割
来源：光电技术研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。