中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique

文献类型:期刊论文

作者Mingyang He; Zhiyou Zhang; Sha Shi; Jinglei Du; Xupeng Li; Shuhong Li; Wenying Ma
刊名Optics Express
出版日期2010
卷号18期号:15页码:15975-15980
通讯作者Mingyang He
中文摘要For the experiments of surface plasmon polaritons (SPPs) interference lithography based on attenuated total reflection-coupling mode to be done conveniently, we introduce a backside-exposure technique in this paper. The physical mechanisms of SPPs interference with the backside -exposure method are studied and the interference fringes with feature size below 65 nm are experimentally obtained. The technique can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid.
英文摘要For the experiments of surface plasmon polaritons (SPPs) interference lithography based on attenuated total reflection-coupling mode to be done conveniently, we introduce a backside-exposure technique in this paper. The physical mechanisms of SPPs interference with the backside -exposure method are studied and the interference fringes with feature size below 65 nm are experimentally obtained. The technique can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid.
语种英语
源URL[http://ir.ioe.ac.cn/handle/181551/6713]  
专题光电技术研究所_微细加工光学技术国家重点实验室(开放室)
作者单位中国科学院光电技术研究所
推荐引用方式
GB/T 7714
Mingyang He,Zhiyou Zhang,Sha Shi,et al. A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique[J]. Optics Express,2010,18(15):15975-15980.
APA Mingyang He.,Zhiyou Zhang.,Sha Shi.,Jinglei Du.,Xupeng Li.,...&Wenying Ma.(2010).A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique.Optics Express,18(15),15975-15980.
MLA Mingyang He,et al."A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique".Optics Express 18.15(2010):15975-15980.

入库方式: OAI收割

来源:光电技术研究所

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