Improving resolution of superlens lithography by phase-shifting mask
文献类型：期刊论文
| 作者 | Yao Na; Lai Zian; Fang Liang; Wang Changtao; Feng Qin; Zhao Zheyu; Luo Xiangang |
| 刊名 | OPTICS EXPRESS
 |
| 出版日期 | 2011 |
| 卷号 | 19期号:17页码:15982-15989 |
| 通讯作者 | Yao N (Yao Na) |
| 中文摘要 | We propose to apply phase-shifting mask (PSM) to superlens lithography to improve its resolution. The PSM comprises of chromium slits alternatively filled by Ag and PMMA. The pi-phase shift is induced whereas thEir transmittance of electric intensity is almost equal for two nEighboring slits. The destructive interference between two slits has greatly improved the spatial resolution and image fidelity. For representative configurations of superlens lithography, FDTD numerical simulations demonstrate that two slits with center-to-center distance d = 35 nm (similar to lambda/10) can be resolved in PSM design, compared to 60 nm (similar to lambda/6) without the PSM. (C)2011 Optical Society of America |
| 英文摘要 | We propose to apply phase-shifting mask (PSM) to superlens lithography to improve its resolution. The PSM comprises of chromium slits alternatively filled by Ag and PMMA. The pi-phase shift is induced whereas thEir transmittance of electric intensity is almost equal for two nEighboring slits. The destructive interference between two slits has greatly improved the spatial resolution and image fidelity. For representative configurations of superlens lithography, FDTD numerical simulations demonstrate that two slits with center-to-center distance d = 35 nm (similar to lambda/10) can be resolved in PSM design, compared to 60 nm (similar to lambda/6) without the PSM. (C)2011 Optical Society of America |
| 语种 | 英语 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/6761]  |
| 专题 | 光电技术研究所_微细加工光学技术国家重点实验室（开放室） |
| 作者单位 | 中国科学院光电技术研究所 |
| 推荐引用方式 GB/T 7714 | Yao Na,Lai Zian,Fang Liang,et al. Improving resolution of superlens lithography by phase-shifting mask[J]. OPTICS EXPRESS,2011,19(17):15982-15989. |
| APA | Yao Na.,Lai Zian.,Fang Liang.,Wang Changtao.,Feng Qin.,...&Luo Xiangang.(2011).Improving resolution of superlens lithography by phase-shifting mask.OPTICS EXPRESS,19(17),15982-15989. |
| MLA | Yao Na,et al."Improving resolution of superlens lithography by phase-shifting mask".OPTICS EXPRESS 19.17(2011):15982-15989. |
入库方式： OAI收割
来源：光电技术研究所
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