Design and Theoretical Analyses of Tip-Insulator-Metal Structure with Bottom-Up Light Illumination: Formations of Elongated Symmetrical Plasmonic Hot Spot at Sub-10 nm Resolution
文献类型：期刊论文
| 作者 | Zhou, Jie; Wang, Changtao; Zhao, Zeyu; Wang, Yanqin; He, Jiayu; Tao, Xing; Luo, Xiangang |
| 刊名 | PLASMONICS
 |
| 出版日期 | 2013 |
| 卷号 | 8期号:2页码:1073-1078 |
| ISSN号 | 1557-1955 |
| 通讯作者 | Luo, XG (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, POB 350, Chengdu 610209, Peoples R China. |
| 中文摘要 | Ag tip-insulator-metal structure with bottom-up light illumination is proposed and theoretically analyzed. It shows that there is a strong plasmonic coupling between Ag tip and metallic surface. Different from oblique light illumination, this novel design possesses unique advantages of symmetrical hot spot profile and enlarged depth of focus at a sub-10-nm spatial resolution. Influences of tip size, insulator, and metallic layer thickness are studied. It is found that the metallic layer thickness greatly affects the plasmonic hot spot quality. Meanwhile, the thickness of photoresist plays a major role in controlling light spot size, indicating that much higher resolution can be achieved for the Ag tips with large curvature radius. |
| 英文摘要 | Ag tip-insulator-metal structure with bottom-up light illumination is proposed and theoretically analyzed. It shows that there is a strong plasmonic coupling between Ag tip and metallic surface. Different from oblique light illumination, this novel design possesses unique advantages of symmetrical hot spot profile and enlarged depth of focus at a sub-10-nm spatial resolution. Influences of tip size, insulator, and metallic layer thickness are studied. It is found that the metallic layer thickness greatly affects the plasmonic hot spot quality. Meanwhile, the thickness of photoresist plays a major role in controlling light spot size, indicating that much higher resolution can be achieved for the Ag tips with large curvature radius. |
| 学科主题 | Plasmonics; Surface plasmons; Nano-lithography; Laser material processing |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000320445700119 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/6831]  |
| 专题 | 光电技术研究所_微细加工光学技术国家重点实验室（开放室） |
| 作者单位 | 1.[Zhou, Jie 2.Wang, Changtao 3.Zhao, Zeyu 4.Wang, Yanqin 5.He, Jiayu 6.Tao, Xing 7.Luo, Xiangang] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhou, Jie,Wang, Changtao,Zhao, Zeyu,et al. Design and Theoretical Analyses of Tip-Insulator-Metal Structure with Bottom-Up Light Illumination: Formations of Elongated Symmetrical Plasmonic Hot Spot at Sub-10 nm Resolution[J]. PLASMONICS,2013,8(2):1073-1078. |
| APA | Zhou, Jie.,Wang, Changtao.,Zhao, Zeyu.,Wang, Yanqin.,He, Jiayu.,...&Luo, Xiangang.(2013).Design and Theoretical Analyses of Tip-Insulator-Metal Structure with Bottom-Up Light Illumination: Formations of Elongated Symmetrical Plasmonic Hot Spot at Sub-10 nm Resolution.PLASMONICS,8(2),1073-1078. |
| MLA | Zhou, Jie,et al."Design and Theoretical Analyses of Tip-Insulator-Metal Structure with Bottom-Up Light Illumination: Formations of Elongated Symmetrical Plasmonic Hot Spot at Sub-10 nm Resolution".PLASMONICS 8.2(2013):1073-1078. |
入库方式： OAI收割
来源：光电技术研究所
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