Improving Imaging Contrast of Non-Contacted Plasmonic Lens by Off-Axis Illumination with High Numerical Aperture
文献类型：期刊论文
| 作者 | Huang, Qizhao; Wang, Changtao; Yao, Na; Zhao, Zeyu; Wang, Yanqin; Gao, Ping; Luo, Yunfei; Zhang, Wei; Wang, Hao; Luo, Xiangang |
| 刊名 | PLASMONICS
 |
| 出版日期 | 2014 |
| 卷号 | 9期号:3页码:699-706 |
| ISSN号 | 1557-1955 |
| 通讯作者 | Luo, XG (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, POB 350, Chengdu 610209, Peoples R China. |
| 中文摘要 | Off-axis illumination plasmonic lens (OAIPL) is proposed and demonstrated to improve the imaging contrast in non-contacted application manner. The spatial Fourier components of light transmitted through the nano-patterns are greatly enhanced in the imaging process by shifting the wave vectors with high numerical aperture off-axis illumination. On the other hand, a reflector in the image area helps to tailor the ratio between electric field components in the tangential and normal directions. These two effects resultantly deliver significant improvement of imaging performance, including enhanced resolution, imaging contrast, and elongation of air gap thickness. In comparison to the case of normal illumination, the air gap thickness for 30 and 60 nm half-pitch resolution is extended to 25 and 100 nm by OAIPL with numerical aperture (NA) = 1.55, respectively. |
| 英文摘要 | Off-axis illumination plasmonic lens (OAIPL) is proposed and demonstrated to improve the imaging contrast in non-contacted application manner. The spatial Fourier components of light transmitted through the nano-patterns are greatly enhanced in the imaging process by shifting the wave vectors with high numerical aperture off-axis illumination. On the other hand, a reflector in the image area helps to tailor the ratio between electric field components in the tangential and normal directions. These two effects resultantly deliver significant improvement of imaging performance, including enhanced resolution, imaging contrast, and elongation of air gap thickness. In comparison to the case of normal illumination, the air gap thickness for 30 and 60 nm half-pitch resolution is extended to 25 and 100 nm by OAIPL with numerical aperture (NA) = 1.55, respectively. |
| 学科主题 | Surface plasmons; Subwavelength structures; Superresolution |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000336021700028 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/6844]  |
| 专题 | 光电技术研究所_微细加工光学技术国家重点实验室（开放室） |
| 作者单位 | 1.[Huang, Qizhao 2.Wang, Changtao 3.Yao, Na 4.Zhao, Zeyu 5.Wang, Yanqin 6.Gao, Ping 7.Luo, Yunfei 8.Zhang, Wei 9.Luo, Xiangang] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China 10.[Huang, Qizhao |
| 推荐引用方式 GB/T 7714 | Huang, Qizhao,Wang, Changtao,Yao, Na,et al. Improving Imaging Contrast of Non-Contacted Plasmonic Lens by Off-Axis Illumination with High Numerical Aperture[J]. PLASMONICS,2014,9(3):699-706. |
| APA | Huang, Qizhao.,Wang, Changtao.,Yao, Na.,Zhao, Zeyu.,Wang, Yanqin.,...&Luo, Xiangang.(2014).Improving Imaging Contrast of Non-Contacted Plasmonic Lens by Off-Axis Illumination with High Numerical Aperture.PLASMONICS,9(3),699-706. |
| MLA | Huang, Qizhao,et al."Improving Imaging Contrast of Non-Contacted Plasmonic Lens by Off-Axis Illumination with High Numerical Aperture".PLASMONICS 9.3(2014):699-706. |
入库方式： OAI收割
来源：光电技术研究所
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