High resolution photolithography with sub-wavelength grating
文献类型：期刊论文
| 作者 | Zhao, Qing1; Liang, Gaofeng1,2; Wang, Changtao2; Huang, Xiaoping1; Chen, Zexiang3; Luo, Xiangang2 |
| 刊名 | Applied Physics A: Materials Science and Processing: Near field optics
 |
| 出版日期 | 2014 |
| 卷号 | 115期号:1页码:69-73 |
| ISSN号 | 09478396 |
| 通讯作者 | Zhao, Q. (zhaoq@uestc.edu.cn) |
| 中文摘要 | Based on the theory of surface plasmon resonance and the special nano-optical effect of metal/dielectric multilayer composites, we obtained a high-resolution image of a sub-wavelength grating. We discussed multilayer parameters on equal thickness, and achieved sufficient contrast and high intensity through numerical simulation based on the finite element method. By chosen the best scheme, an experimental of multilayer planar lens lithography has been carried out. The main point is the use of metal-dielectric composites to realize high-resolution image under 365-nm polarization light incidence. By controlling the experimental parameters accurately, a fidelity image is recorded on the photoresist. © 2013 Springer-Verlag Berlin Heidelberg. |
| 英文摘要 | Based on the theory of surface plasmon resonance and the special nano-optical effect of metal/dielectric multilayer composites, we obtained a high-resolution image of a sub-wavelength grating. We discussed multilayer parameters on equal thickness, and achieved sufficient contrast and high intensity through numerical simulation based on the finite element method. By chosen the best scheme, an experimental of multilayer planar lens lithography has been carried out. The main point is the use of metal-dielectric composites to realize high-resolution image under 365-nm polarization light incidence. By controlling the experimental parameters accurately, a fidelity image is recorded on the photoresist. © 2013 Springer-Verlag Berlin Heidelberg. |
| 学科主题 | Diffraction gratings - Near field scanning optical microscopy - Photoresists |
| 收录类别 | SCI ; EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000333612400012 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/6866]  |
| 专题 | 光电技术研究所_微细加工光学技术国家重点实验室（开放室） |
| 作者单位 | 1.School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China 2.State Key Lab of Optical Technologies on Nano-fabrication and Micro-engineering, Institute of Optical and Electronics, Chinese Academy of Science, Chengdu 610209, China 3.School of Optic-Electronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China |
| 推荐引用方式 GB/T 7714 | Zhao, Qing,Liang, Gaofeng,Wang, Changtao,et al. High resolution photolithography with sub-wavelength grating[J]. Applied Physics A: Materials Science and Processing: Near field optics,2014,115(1):69-73. |
| APA | Zhao, Qing,Liang, Gaofeng,Wang, Changtao,Huang, Xiaoping,Chen, Zexiang,&Luo, Xiangang.(2014).High resolution photolithography with sub-wavelength grating.Applied Physics A: Materials Science and Processing: Near field optics,115(1),69-73. |
| MLA | Zhao, Qing,et al."High resolution photolithography with sub-wavelength grating".Applied Physics A: Materials Science and Processing: Near field optics 115.1(2014):69-73. |
入库方式： OAI收割
来源：光电技术研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。