Forming Sub-32-nm High-Aspect Plasmonic Spot via Bowtie Aperture Combined with Metal-Insulator-Metal Scheme
文献类型：期刊论文
| 作者 | Wang, Yaohui; Yao, Na; Zhang, Wei; He, Jiayu; Wang, Changtao; Wang, Yanqin; Zhao, Zeyu; Luo, Xiangang |
| 刊名 | PLASMONICS
 |
| 出版日期 | 2015 |
| 卷号 | 10期号:6页码:1607-1613 |
| ISSN号 | 1557-1955 |
| 中文摘要 | We theoretically utilize bowtie aperture combined with metal-insulator-metal (MIM) scheme to obtain sub-32-nm (lambda/12) high-aspect plasmonic spots. The improvement of the depth profile is attributed to the asymmetry electromagnetic mode excitation in MIM structure and the decaying compensation of the reflective Ag layer. A theoretical near-field exposure model has been used to evaluate the exposure depth in the photoresist. It is demonstrated that the exposure depth of the sub-32-nm plasmonic spot is more than 20 nm, which is about four times of the bowtie aperture without MIM scheme. The influences of the air gap tolerance and the ridge gap size of bowtie aperture are also discussed. |
| 英文摘要 | We theoretically utilize bowtie aperture combined with metal-insulator-metal (MIM) scheme to obtain sub-32-nm (lambda/12) high-aspect plasmonic spots. The improvement of the depth profile is attributed to the asymmetry electromagnetic mode excitation in MIM structure and the decaying compensation of the reflective Ag layer. A theoretical near-field exposure model has been used to evaluate the exposure depth in the photoresist. It is demonstrated that the exposure depth of the sub-32-nm plasmonic spot is more than 20 nm, which is about four times of the bowtie aperture without MIM scheme. The influences of the air gap tolerance and the ridge gap size of bowtie aperture are also discussed. |
| 学科主题 | OFF-AXIS ILLUMINATION; NEAR-FIELD; NANOLITHOGRAPHY; LITHOGRAPHY; ANTENNAS; LENS |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000364966300046 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/6882]  |
| 专题 | 光电技术研究所_微细加工光学技术国家重点实验室（开放室） |
| 推荐引用方式 GB/T 7714 | Wang, Yaohui,Yao, Na,Zhang, Wei,et al. Forming Sub-32-nm High-Aspect Plasmonic Spot via Bowtie Aperture Combined with Metal-Insulator-Metal Scheme[J]. PLASMONICS,2015,10(6):1607-1613. |
| APA | Wang, Yaohui.,Yao, Na.,Zhang, Wei.,He, Jiayu.,Wang, Changtao.,...&Luo, Xiangang.(2015).Forming Sub-32-nm High-Aspect Plasmonic Spot via Bowtie Aperture Combined with Metal-Insulator-Metal Scheme.PLASMONICS,10(6),1607-1613. |
| MLA | Wang, Yaohui,et al."Forming Sub-32-nm High-Aspect Plasmonic Spot via Bowtie Aperture Combined with Metal-Insulator-Metal Scheme".PLASMONICS 10.6(2015):1607-1613. |
入库方式： OAI收割
来源：光电技术研究所
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