Wafer focusing measurement of optical lithography system based on Hartmann-Shack wavefront testing
文献类型：期刊论文
| 作者 | Zhu, Xianchang; Hu, Song; Zhao, Lixin |
| 刊名 | OPTICS AND LASERS IN ENGINEERING
 |
| 出版日期 | 2015 |
| 卷号 | 66页码:128-131 |
| ISSN号 | 0143-8166 |
| 通讯作者 | Zhu, XC (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Sichuan, Peoples R China. |
| 中文摘要 | To improve the focusing measurement precision of wafer in optical lithography instrument (OLI), a method based on Hartmann-Shack (HS) testing principle is introduced. Defocus of wafer is immediately detected by measuring the image change between plane and spherical wavefront. As defocus is measured by every sub-lens of microlens array (MLA), serials of defocus position are calculated at single shot of CCD sensor. Choose the average in this measurement the outstanding advantage of this technology is the high accuracy and efficiency. With an experiment to validate the feasibility, the accuracy of focusing measurement is indicated as 20 nm. (C) 2014 Elsevier Ltd. All rights reserved. |
| 英文摘要 | To improve the focusing measurement precision of wafer in optical lithography instrument (OLI), a method based on Hartmann-Shack (HS) testing principle is introduced. Defocus of wafer is immediately detected by measuring the image change between plane and spherical wavefront. As defocus is measured by every sub-lens of microlens array (MLA), serials of defocus position are calculated at single shot of CCD sensor. Choose the average in this measurement the outstanding advantage of this technology is the high accuracy and efficiency. With an experiment to validate the feasibility, the accuracy of focusing measurement is indicated as 20 nm. (C) 2014 Elsevier Ltd. All rights reserved. |
| 学科主题 | Focusing; Microlens array; Lithography |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000347020700017 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/6900]  |
| 专题 | 光电技术研究所_微细加工光学技术国家重点实验室（开放室） |
| 作者单位 | 1.[Zhu, Xianchang 2.Hu, Song 3.Zhao, Lixin] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Sichuan, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhu, Xianchang,Hu, Song,Zhao, Lixin. Wafer focusing measurement of optical lithography system based on Hartmann-Shack wavefront testing[J]. OPTICS AND LASERS IN ENGINEERING,2015,66:128-131. |
| APA | Zhu, Xianchang,Hu, Song,&Zhao, Lixin.(2015).Wafer focusing measurement of optical lithography system based on Hartmann-Shack wavefront testing.OPTICS AND LASERS IN ENGINEERING,66,128-131. |
| MLA | Zhu, Xianchang,et al."Wafer focusing measurement of optical lithography system based on Hartmann-Shack wavefront testing".OPTICS AND LASERS IN ENGINEERING 66(2015):128-131. |
入库方式： OAI收割
来源：光电技术研究所
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